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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 47, Issue 8 PART 1, 2008, Pages 6288-6292

Theoretical study on the dependence of acid distribution on material properties of chemically amplified extreme ultraviolet resists

(3) Kozawa, Takahiro a Tagawa, Seiichi a Shell, Melissa b

a OSAKA UNIVERSITY (Japan)

b INTEL CORPORATION (United States)

Author keywords

Chemically amplified resist; Dielectric constant; EUV lithography; Reaction radius; Thermalization distance

Indexed keywords

ABS RESINS; CERAMIC CAPACITORS; CLARIFICATION; COMMERCE; DIELECTRIC WAVEGUIDES; ELECTRON BEAM LITHOGRAPHY; IONIZING RADIATION; LASER PULSES; MONTE CARLO METHODS; PERMITTIVITY; PHOTORESISTORS; PHOTORESISTS; POLYMERS; ULTRAVIOLET DEVICES;

CHEMICALLY AMPLIFIED RESIST; DIELECTRIC CONSTANT; EUV LITHOGRAPHY; REACTION RADIUS; THERMALIZATION DISTANCE;

ACIDS;

EID: 55149089515 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.6288 Document Type: Article

Times cited : (17)

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