Film quantum yields of ultrahigh PAG EUV photoresists

Journal of Photopolymer Science and Technology

Volumn 21, Issue 3, 2008, Pages 457-464

  Brainard, Robert ^a   Higgins, Craig ^a   Hassanein, Elsayed ^b   Matyi, Richard ^a   Wüest, Andrea ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b Sohag University   (Egypt)

^c SEMATECH   (United States)

Author keywords

Base titration; EUV; Film quantum yield; Photoresists; Ultrahigh PAG resists

Indexed keywords

EID: 50149083464     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.457     Document Type: Article

References (25)

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