Proton dynamics in chemically amplified electron beam resists

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 7 A, 2004, Pages

  Yamamoto, Hiroki ^a   Kozawa, Takahiro ^a   Nakano, Atsuro ^a   Okamoto, Kazumasa ^a   Yamamoto, Yukio ^a   Ando, Tomoyuki ^b   Sato, Mitsuru ^b   Komano, Hiroji ^b   Tagawa, Seiichi ^b  

^a OSAKA UNIVERSITY   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

Acid; Chemically amplified resist; Doslmetry; Electron beam; Lithography; Proton; Proton diffusion

Indexed keywords

ACID DENSITY; BASE POLYMER; CHEMICALLY AMPLIFIED RESIST; PROTON DIFFUSION;

ABSORPTION; AMPLIFIERS (ELECTRONIC); DIFFUSION; DOSIMETRY; ELECTRON BEAMS; GAMMA RAYS; IONIZATION; PARTICLE ACCELERATORS; PHOTOLITHOGRAPHY; POLARIZATION;

THIN FILMS;

EID: 4444249958     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.L848     Document Type: Article

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