Analysis of acid yield generated in chemically amplified electron beam resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3055-3060

  Kozawa, Takahiro ^a   Shigaki, Takumi ^a   Okamoto, Kazumasa ^a   Saeki, Akinori ^a   Tagawa, Seiichi ^a   Kai, Toshiyuki ^b   Shimokawa, Tsutomu ^b  

^a OSAKA UNIVERSITY   (Japan)

^b JSR CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); IONIZATION; IONIZING RADIATION; PHOTORESISTS; PHOTOSENSITIZERS;

POLYMER IONIZATION; RESIST MATERIALS;

ELECTRON BEAMS;

EID: 33845239716     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366656     Document Type: Article

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