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Applied Physics Express

Volumn 1, Issue 2, 2008, Pages

Dependence of acid generation efficiency on molecular structures of acid generators upon extreme ultraviolet radiation

(5) Hirose, Ryo a Kozawa, Takahiro a Tagawa, Seiichi a Kai, Toshiyuki b Shimokawa, Tsutomu b

a OSAKA UNIVERSITY (Japan)

b JSR CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; COMMERCE; ELECTRON BEAM LITHOGRAPHY; LASER PULSES; MOLECULAR STRUCTURE; PHOTORESISTS; QUANTUM CHEMISTRY; ROUGHNESS MEASUREMENT; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION;

ACID GENERATION EFFICIENCIES; ACID GENERATORS; ACID MOLECULES; CHEMICAL AMPLIFICATIONS; CONCENTRATION RANGES; EXTREME ULTRAVIOLET RADIATIONS; EXTREME ULTRAVIOLETS; HIGH RESOLUTIONS; HIGH SENSITIVITIES; LINE EDGE ROUGHNESSES; NONIONIC;

ACIDS;

EID: 57049131026 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.1.027004 Document Type: Article

Times cited : (60)

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