Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 3, 2006, Pages 1234-1237

  Cain, Jason P ^a   Naulleau, Patrick P ^b   Gullikson, Eric M ^c   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; LITHOGRAPHIC CHARACTERIZATION; NUMERICAL APERTURE;

DIES; PHOTOLITHOGRAPHY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

SYNTHETIC APERTURES;

EID: 33744827420     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2194946     Document Type: Article

References (8)

1. J. C. Stover, Optical Scattering Measurement and Analysis, 2nd ed. (SPIE, Bellingham, WA, 1995).
2. P. Naulleau et al., J. Vac. Sci. Technol. B 22, 2962 (2004).
3. J. P. Kirk, Proc. SPIE 2197, 566 (1994).
4. S. H. Lee, P. Naulleau, C. Krautschik, M. Chandhok, H. N. Chapman, D. J. O'Connell, and M. Goldstein, Proc. SPIE 5037, 103 (2003).
5. PROLITH is a registered trademark of KLA-Tencor Corporation, 160 Rio Robles, San Jose, California 95134.
6. K. Goldberg, P. Naulleau, P. Denham, S. Rekawa, K. Jackson, E. Anderson, and J. Liddle, J. Vac. Sci. Technol. B 22, 2956 (2004).
7. P. Naulleau, J. Cain, and K. Goldberg, J. Vac. Sci. Technol. B (to be published).
8. P. Naulleau, J. Cain, and K. Goldberg, Appl. Opt. 45, 1957 (2006).