SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 476, Issue 1, 2005, Pages 51-58

Growth mechanism and characterization of chemical oxide films produced in peroxide mixtures on Si(100) surfaces

(7) Petitdidier, S a Bertagna, V b Rochat, N c Rouchon, D c Besson, P a Erre, R b Chemla, M d

a STMICROELECTRONICS (France)

b UNIVERSITÉ D'ORLÉANS (France)

c CEA LETI (France)

d SORBONNE UNIVERSITÉ (France)

Author keywords

Electrochemical impedance; Growth kinetics; SC1; SC2; Silicon oxide; Silicon surface treatment

Indexed keywords

CHARACTERIZATION; CHARGE TRANSFER; ELECTRIC IMPEDANCE; ELECTROCHEMISTRY; ELECTROLYTES; GROWTH KINETICS; HYDROGEN BONDS; HYDROGEN PEROXIDE; INFRARED SPECTROSCOPY; MIXTURES; OXIDATION; PH EFFECTS; SEMICONDUCTOR GROWTH; SILICON; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC LAYERS; ELECTROCHEMICAL IMPEDANCE; SC1; SC2; SILICON OXIDES; SILICON SURFACE TREATMENT;

SEMICONDUCTING FILMS;

EID: 13844317790 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.09.008 Document Type: Article

Times cited : (18)

References (28)

1
- 0004759379
- W. Kern, and D.A. Puotinen RCA Rev. 31 1970 186
- (1970) RCA Rev. , vol.31 , pp. 186
- Kern, W.¹ Puotinen, D.A.²

2
- 0003821752
- Noyes Publications New Jersey
- W. Kern Handbook of Semiconductor Wafer Cleaning Technology 1993 Noyes Publications New Jersey
- (1993) Handbook of Semiconductor Wafer Cleaning Technology
- Kern, W.¹

3
- 0031119010
- S. Ojima, K. Kubo, M. Kato, M. Toda, and T. Ohmi J. Electrochem. Soc. 144 1997 1482
- (1997) J. Electrochem. Soc. , vol.144 , pp. 1482
- Ojima, S.¹ Kubo, K.² Kato, M.³ Toda, M.⁴ Ohmi, T.⁵

4
- 0031272129
- R. Sugino, Y. Okui, M. Shigeno, S. Ohkubo, T. Katasaki, and T. Ito J. Electrochem. Soc. 144 1997 3984
- (1997) J. Electrochem. Soc. , vol.144 , pp. 3984
- Sugino, R.¹ Okui, Y.² Shigeno, M.³ Ohkubo, S.⁴ Katasaki, T.⁵ Ito, T.⁶

5
- 0142107409
- L. Sang Woo Jpn. J. Appl. Phys. 42 8 2003 5002
- (2003) Jpn. J. Appl. Phys. , vol.42 , Issue.8 , pp. 5002
- Sang Woo, L.¹

6
- 0032784357
- F. Tardif, T. Lardin, and R. Novak Solid State Phenom. 65/67 1999 19
- (1999) Solid State Phenom. , vol.65-67 , pp. 19
- Tardif, F.¹ Lardin, T.² Novak, R.³

7
- 0000697110
- B. Brar, G.D. Wilk, and A.C. Seabaugh Appl. Phys. Lett. 69 18 1996 2728
- (1996) Appl. Phys. Lett. , vol.69 , Issue.18 , pp. 2728
- Brar, B.¹ Wilk, G.D.² Seabaugh, A.C.³

8
- 0024639632
- G. Gould, and E.A. Irene J. Electrochem. Soc. 136 4 1989 1108
- (1989) J. Electrochem. Soc. , vol.136 , Issue.4 , pp. 1108
- Gould, G.¹ Irene, E.A.²

9
- 0027667474
- S. Adachi, and K. Utani Jpn. J. Appl. Phys. 32 9A 1993 L1189 (part 2)
- (1993) Jpn. J. Appl. Phys. , vol.32 , Issue.9
- Adachi, S.¹ Utani, K.²

10
- 0000821072
- T. Ohmi, T. Isagawa, M. Kogure, and T. Imaoka J. Electrochem. Soc. 140 3 1993 804
- (1993) J. Electrochem. Soc. , vol.140 , Issue.3 , pp. 804
- Ohmi, T.¹ Isagawa, T.² Kogure, M.³ Imaoka, T.⁴

11
- 0347024499
- H. Ogawa, N. Terada, K. Sugiyama, K. Moriki, N. Miyata, T. Aoyoma, R. Sugino, T. Ito, and T. Hattori Appl. Surf. Sci. 56-58 1992 836
- (1992) Appl. Surf. Sci. , vol.56-58 , pp. 836
- Ogawa, H.¹ Terada, N.² Sugiyama, K.³ Moriki, K.⁴ Miyata, N.⁵ Aoyoma, T.⁶ Sugino, R.⁷ Ito, T.⁸ Hattori, T.⁹

12
- 0001302447
- Y. Sugita, and S. Watanabe Jpn. J. Appl. Phys. 37 1998 3272
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 3272
- Sugita, Y.¹ Watanabe, S.²

13
- 0030245931
- H. Ogawa, K. Ishikawa, and S. Fujimura J. Electrochem. Soc. 143 1996 2995
- (1996) J. Electrochem. Soc. , vol.143 , pp. 2995
- Ogawa, H.¹ Ishikawa, K.² Fujimura, S.³

14
- 0037091477
- N. Rochat, A. Chabli, F. Bertin, M. Olivier, C. Vergnaud, and P. Mur J. Appl. Phys. 91 8 2002 5029
- (2002) J. Appl. Phys. , vol.91 , Issue.8 , pp. 5029
- Rochat, N.¹ Chabli, A.² Bertin, F.³ Olivier, M.⁴ Vergnaud, C.⁵ Mur, P.⁶

15
- 0030259928
- Y. Sugita, S. Watanabe, and N. Awaji Jpn. J. Appl. Phys. Part 1 35 10 1996 5437
- (1996) Jpn. J. Appl. Phys. Part 1 , vol.35 , Issue.10 , pp. 5437
- Sugita, Y.¹ Watanabe, S.² Awaji, N.³

16
- 0035450858
- V. Bertagna, R. Erre, F. Rouelle, M. Chemla, S. Petitdidier, and D. Lévy Electrochim. Acta 47 2001 129
- (2001) Electrochim. Acta , vol.47 , pp. 129
- Bertagna, V.¹ Erre, R.² Rouelle, F.³ Chemla, M.⁴ Petitdidier, S.⁵ Lévy, D.⁶

17
- 0035615040
- V. Bertagna, R. Erre, F. Rouelle, D. Lévy, S. Petitdidier, and M. Chemla J. Solid State Electrochem. 5 2001 306
- (2001) J. Solid State Electrochem. , vol.5 , pp. 306
- Bertagna, V.¹ Erre, R.² Rouelle, F.³ Lévy, D.⁴ Petitdidier, S.⁵ Chemla, M.⁶

18
- 0031256931
- V. Bertagna, F. Rouelle, and M. Chemla J. Appl. Electrochem. 27 1997 1179
- (1997) J. Appl. Electrochem. , vol.27 , pp. 1179
- Bertagna, V.¹ Rouelle, F.² Chemla, M.³

19
- 0009331533
- Y.B. Wang, P. Han, Q. Chen, and M. Willander J. Appl. Phys. 82 1997 5868
- (1997) J. Appl. Phys. , vol.82 , pp. 5868
- Wang, Y.B.¹ Han, P.² Chen, Q.³ Willander, M.⁴

20
- 84901281048
- F. Yano, A. Hiraoka, T. Itoga, K. Kanehori, and Y. Mitsui J. Vac. Sci. Technol., A, Vac. Surf. Films 13 6 1995 2671
- (1995) J. Vac. Sci. Technol., A, Vac. Surf. Films , vol.13 , Issue.6 , pp. 2671
- Yano, F.¹ Hiraoka, A.² Itoga, T.³ Kanehori, K.⁴ Mitsui, Y.⁵

21
- 0033639570
- G.K. Celler, D.L. Barr, and J.M. Rosamilla Electrochem. Solid-State Lett. 3 1 2000 47
- (2000) Electrochem. Solid-State Lett. , vol.3 , Issue.1 , pp. 47
- Celler, G.K.¹ Barr, D.L.² Rosamilla, J.M.³

22
- 26744445785
- D.W. Berreman Phys. Rev. 130 6 1963 2193
- (1963) Phys. Rev. , vol.130 , Issue.6 , pp. 2193
- Berreman, D.W.¹

23
- 0037955940
- C. Wagner, and K. Grunewald Z. Phys. Chem., B Chem. Elem. Proz. Aufbau Mater. 40 1938 455
- (1938) Z. Phys. Chem., B Chem. Elem. Proz. Aufbau Mater. , vol.40 , pp. 455
- Wagner, C.¹ Grunewald, K.²

24
- 1642621158
- B.E. Deal, and A.S. Grove J. Appl. Phys. 36 1965 3770
- (1965) J. Appl. Phys. , vol.36 , pp. 3770
- Deal, B.E.¹ Grove, A.S.²

25
- 0033872958
- F. De Smedt, C. Vinkier, I. Cornelissen, S. De Gendt, and M. Heyns J. Electrochem. Soc. 147 3 2000 1124
- (2000) J. Electrochem. Soc. , vol.147 , Issue.3 , pp. 1124
- De Smedt, F.¹ Vinkier, C.² Cornelissen, I.³ De Gendt, S.⁴ Heyns, M.⁵

26
- 0014744669
- F.P. Fehlner, and N.F. Mott Oxid. Met. 2 1 1970 59
- (1970) Oxid. Met. , vol.2 , Issue.1 , pp. 59
- Fehlner, F.P.¹ Mott, N.F.²

27
- 13844309885
- Cleaning Technology in Semiconductor Device Manufacturing VII, San Francisco, USA September 1-8, 2001
- S. Petitdidier, F. Guyader, K. Barla, D. Rouchon, N. Rochat, R. Erre, and V. Bertagna Cleaning Technology in Semiconductor Device Manufacturing VII, San Francisco, USA September 1-8, 2001 Proc., Electrochem. Soc. 26 2001 205
- (2001) Proc., Electrochem. Soc. , vol.26 , pp. 205
- Petitdidier, S.¹ Guyader, F.² Barla, K.³ Rouchon, D.⁴ Rochat, N.⁵ Erre, R.⁶ Bertagna, V.⁷

28
- 4644241884
- M. Niwano Surf. Sci. 427-428 1999 199
- (1999) Surf. Sci. , vol.427-428 , pp. 199
- Niwano, M.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.