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Volumn 20, Issue 10, 2004, Pages 4295-4298

Photochemistry and patterning of monolayer films from 11- phenylundecyltrichlorosilane

Author keywords

[No Author keywords available]

Indexed keywords

METAL DEPOSITION; PATTERNING; PHOTOPATTERNED; PYRIDYL;

EID: 2542634932     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la030353m     Document Type: Article
Times cited : (19)

References (37)
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    • note
    • 3Si: C, 55.81; H, 7.44; Si, 7.68. Found: C, 56.17; H, 7.69; Si, 8.21.
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    • 4).
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    • The LD-FTMB experiments were performed with a Cymer ArF excimer laser (193 nm) in a vacuum chamber. The experimental configuration is described in ref 5.
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    • Calculations using the AMI Hamiltonian (MOPAC 6.0 package) find that the bond most likely to undergo homolytic cleavage is the carbon-carbon bond at the benzyl postion (C-C-Ph) in 11-phenyl-undecylsilanetriol. The second weakest bond is the benzyl C-H bond.
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    • 4 for 30 min resulted in bromination of samples and unirradiated controls, as determined by XPS.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.