Formation and reactivity of high quality halogen terminated Si(1 1 1) surfaces

Surface Science

Volumn 579, Issue 2-3, 2005, Pages 89-96

  Eves, B J ^a   Lopinski, G P ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Bromine; Chlorine; Electron energy loss; Oxidation; Scanning tunneling microscopy; Silicon; Surface chemistry; Water

Indexed keywords

BROMINE; CHLORINE; CONTAMINATION; ENERGY DISSIPATION; HALOGEN ELEMENTS; HALOGENATION; OXIDATION; SCANNING TUNNELING MICROSCOPY; SILICON; VAPORS; WATER;

BACKBONDS; CHLORINE TERMINATED SURFACES; ELECTRON ENERGY LOSS; SILICON SURFACES;

SURFACE CHEMISTRY;

EID: 14944377054     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.02.006     Document Type: Article

References (30)

1. R.A. Wolkow Ann. Rev. Phys. Chem. 50 1999 413
2. D.D.M. Wayner, and R.A. Wolkow J. Chem. Soc., Perkin Trans. 2 2002 23
3. J.M. Buriak Chem. Rev. 102 2002 1271
4. G.S. Higashi, Y.J. Chabal, G.W. Trucks, and K. Ragavachari Appl. Phys. Lett. 12 1990 656
5. M.R. Linford, and C.E.D. Chidsey J. Am. Chem. Soc. 115 1993 12631
6. A. Bansal, X. Li, I. Lauermann, N.S. Lewis, S.I. Yi, and W.H. Weinberg J. Am. Chem. Soc. 118 1996 7225
7. J. He, S.N. Patitsas, K.F. Preston, R.A. Wolkow, and D.D.M. Wayner Chem. Phys. Lett. 286 1998 508
8. X.Y. Zhu, V. Boiadjiev, J.A. Mulder, R.P. Hsung, and R.C. Major Langmuir 16 2000 6766
9. W. Cai, Z. Lin, T. Strother, L.M. Smith, and R.J. Hamers J. Phys. Chem. B 106 2002 2656
10. W.F. Bergerson, J.A. Mulder, R.P. Hsung, and X.Y. Zhu J. Am. Chem. Soc. 121 1999 454
11. J. Terry, R. Mo, C. Wigren, R. Cao, G. Mount, P. Pianetta, M.R. Linford, and C.E.D. Chidsey Nucl. Instrum. Methods Phys. Res. B 133 1997 94
12. H. Luo, C.E.D. Chidsey, and Y.J. Chabal Mater. Res. Soc. Proc. 477 1997 415
13. Z. Li, T.I. Kamins, X. Li, and R.S. Williams Surf. Sci. 554 2004 L81
14. S. Rivillon, F. Amy, Y.J. Chabal, and M.M. Frank Appl. Phys. Lett. 85 2004 2583
15. G.P. Lopinski, B.J. Eves, O. Hul'ko, C. Mark, S.N. Patitsas, R. Boukherroub, T.R. Ward, Phys. Rev. B, in press
16. C.P. Wade, and C.E.D. Chidsey Appl. Phys. Lett. 71 1998 1679
17. P. Dumas, and Y. Chabal Chem Phys. Lett. 181 1991 537
18. Ch. Stuhlmann, G. Bogdanyi, and H. Ibach Phys. Rev. B 45 1992 6786
19. A. Bansal, X. Li, S.I. Yi, W.H. Weinberg, and N.S. Lewis J. Phys. Chem. B 105 2001 10266
20. J.S. Villarrubia, and J.J. Boland Phys. Rev. Lett. 63 1989 306
21. C.M. Aldao, and J.H. Weaver Prog. Surf. Sci. 68 2001 189
22. S. Guha, E. Cartier, M.A. Gribelyuk, N.A. Bojarczuk, and M.C. Copel Appl. Phys. Lett. 77 2000 2710
23. L.F. Edge Appl. Phys. Lett. 84 2004 4629
24. B.J. Eves, G.P. Lopinski, in preparation
25. J.W. Klaus, O. Sneh, and S.M. George Science 278 1997 1934
26. H. Ikeda, Y. Nakagawa, M. Toshima, S. Furuta, S. Zaima, and Y. Yasuda Appl. Surf. Sci. 117/118 1997 109
27. M.K. Weldon, B.B. Stefanov, K. Ragavachari, and Y.J. Chabal Phys. Rev. Lett. 79 1997 2851
28. J.A. Schaefer, D. Frankel, F. Stuckl, W. Gopel, and G. Lapeyre Surf. Sci. 139 1984 L209
29. M.J.S. Dewar, E.G. Zoebisch, E.F. Healy, and J.J.P. Stewart J. Am. Chem. Soc. 107 1985 3902
30. G.P. Lopinski, unpublished