Determination of the bonding of alkyl monolayers to the Si(111) surface using chemical-shift, scanned-energy photoelectron diffraction

Applied Physics Letters

Volumn 71, Issue 8, 1997, Pages 1056-1058

  Terry, Jeff ^a   Linford, Matthew R ^a   Wigren, Christer ^a   Cao, Renyu ^a   Pianetta, Piero ^a   Chidsey, Christopher E D ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001437602     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119726     Document Type: Article

References (14)

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4. C. S. Fadley, "Recent developments in photoelectron diffraction," in Core-Level Spectroscopy in Condensed Systems, Proceedings of the Tenth Taniguchi International Symposium, edited by J. Kanamori and A. Kotani (Springer, Berlin, West Germany, 1988), p. 236.
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10. The photoelectron diffraction measurements were performed at the Stanford Synchrotron Radiation Laboratory using BL 10-1, a spherical grating monochromator (SGM) beam line, with photon energies between 180 and 1000 eV. The analysis chamber utilized a 100 mm VSW hemispherical electron energy analyzer fixed at an angle of 30° with respect to the incident photon beam. The angular reproducibility of the manipulator is better than 0.25° and the angular acceptance of the hemispherical analyzer is ± 1.5°. The total energy resolution (monochromator and analyzer) was determined to be 150 meV at a photon energy of 300 eV.
11. The absence of diffraction in the component attributed to the aliphatic carbon atoms could be due to either a range of conformational isomers in the chain, dynamic fluctuations of the chain, or the presence of an adventitious overlayer of carbon.
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