-
3
-
-
33746615120
-
-
Chovelon, J. M.; Fombon, J. J.; Clechet, P.; Jaffrezic-Renault, N.; Martelet, C.; Nyamsi, A.; Cros, Y. Seniors Actuators B 1992, 8, 221-225. Duvault, Y.; Gagnaire, A.; Gardies, F.; Jaffrezic-Renault, N.; Martelet, C.; Morel, D.; Serpinet, J.; Duvault, J. L. Thin Solid Films 1990, 185, 169-179.
-
(1992)
Actuators B
, vol.8
, pp. 221-225
-
-
Chovelon, J.M.1
Fombon, J.J.2
Clechet, P.3
Jaffrezic-Renault, N.4
Martelet, C.5
Nyamsi, A.6
Seniors, C.Y.7
-
4
-
-
0025385504
-
-
Chovelon, J. M.; Fombon, J. J.; Clechet, P.; Jaffrezic-Renault, N.; Martelet, C.; Nyamsi, A.; Cros, Y. Seniors Actuators B 1992, 8, 221-225. Duvault, Y.; Gagnaire, A.; Gardies, F.; Jaffrezic-Renault, N.; Martelet, C.; Morel, D.; Serpinet, J.; Duvault, J. L. Thin Solid Films 1990, 185, 169-179.
-
(1990)
Thin Solid Films
, vol.185
, pp. 169-179
-
-
Duvault, Y.1
Gagnaire, A.2
Gardies, F.3
Jaffrezic-Renault, N.4
Martelet, C.5
Morel, D.6
Serpinet, J.7
Duvault, J.L.8
-
5
-
-
26844559968
-
-
Hoffmann, H.; Mayer, U.; Krischanitz, A. Langmuir 1995, 11, 1304.
-
(1995)
Langmuir
, vol.11
, pp. 1304
-
-
Hoffmann, H.1
Mayer, U.2
Krischanitz, A.3
-
9
-
-
84996528794
-
-
Sheen, C. W.; Shi, J. X.; Martensson, J.; Parikh, A. N.; Allara, D. J. Am. Chem. Soc. 1992, 114, 1514. Tiberio, R. C.; Craighead, H. G.; Lercel, M.; Lau, T.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1993, 62, 476. Lercel, M.; Redinho, G. F.; Craighead, H. G.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1994, 65, 974.
-
(1992)
J. Am. Chem. Soc.
, vol.114
, pp. 1514
-
-
Sheen, C.W.1
Shi, J.X.2
Martensson, J.3
Parikh, A.N.4
Allara, D.5
-
10
-
-
0027542025
-
-
Sheen, C. W.; Shi, J. X.; Martensson, J.; Parikh, A. N.; Allara, D. J. Am. Chem. Soc. 1992, 114, 1514. Tiberio, R. C.; Craighead, H. G.; Lercel, M.; Lau, T.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1993, 62, 476. Lercel, M.; Redinho, G. F.; Craighead, H. G.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1994, 65, 974.
-
(1993)
Appl. Phys. Lett.
, vol.62
, pp. 476
-
-
Tiberio, R.C.1
Craighead, H.G.2
Lercel, M.3
Lau, T.4
Sheen, C.W.5
Allara, D.L.6
-
11
-
-
7244242962
-
-
Sheen, C. W.; Shi, J. X.; Martensson, J.; Parikh, A. N.; Allara, D. J. Am. Chem. Soc. 1992, 114, 1514. Tiberio, R. C.; Craighead, H. G.; Lercel, M.; Lau, T.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1993, 62, 476. Lercel, M.; Redinho, G. F.; Craighead, H. G.; Sheen, C. W.; Allara, D. L. Appl. Phys. Lett. 1994, 65, 974.
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 974
-
-
Lercel, M.1
Redinho, G.F.2
Craighead, H.G.3
Sheen, C.W.4
Allara, D.L.5
-
12
-
-
84930010586
-
-
Lunt, S. R.; Santangelo, P. G.; Lewis, N. S. J. Vac. Sci. Technol. 1991, B9, 2333. Lunt, S. R.; Ryba, G. N.; Santangelo, P. G.; Lewis, N. S. J. Appl. Phys. 1991, 70, 7449.
-
(1991)
J. Vac. Sci. Technol.
, vol.B9
, pp. 2333
-
-
Lunt, S.R.1
Santangelo, P.G.2
Lewis, N.S.3
-
13
-
-
0012708014
-
-
Lunt, S. R.; Santangelo, P. G.; Lewis, N. S. J. Vac. Sci. Technol. 1991, B9, 2333. Lunt, S. R.; Ryba, G. N.; Santangelo, P. G.; Lewis, N. S. J. Appl. Phys. 1991, 70, 7449.
-
(1991)
J. Appl. Phys.
, vol.70
, pp. 7449
-
-
Lunt, S.R.1
Ryba, G.N.2
Santangelo, P.G.3
Lewis, N.S.4
-
15
-
-
0029274673
-
-
Lindford, M. R.; Fenter, P.; Eisenberger, P. M.; Chidsey, C. E. D. J. Am. Chem. Soc. 1995, 117, 3145.
-
(1995)
J. Am. Chem. Soc.
, vol.117
, pp. 3145
-
-
Lindford, M.R.1
Fenter, P.2
Eisenberger, P.M.3
Chidsey, C.E.D.4
-
16
-
-
0003821752
-
-
Kern, W., Ed.; Noyes Publications: Park Ridge
-
Higashi, G. S.; Chabal, Y. J. In Handbook of Semiconductor Wafer Cleaning Technology; Kern, W., Ed.; Noyes Publications: Park Ridge, 1993. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897.
-
(1993)
Handbook of Semiconductor Wafer Cleaning Technology
-
-
Higashi, G.S.1
Chabal, Y.J.2
-
17
-
-
17044396344
-
-
Higashi, G. S.; Chabal, Y. J. In Handbook of Semiconductor Wafer Cleaning Technology; Kern, W., Ed.; Noyes Publications: Park Ridge, 1993. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897.
-
(1991)
J. Chem. Phys.
, vol.95
, pp. 2897
-
-
Jakob, P.1
Chabal, Y.J.2
-
18
-
-
17044396344
-
-
Higashi, G. S.; Chabal, Y. J. In Handbook of Semiconductor Wafer Cleaning Technology; Kern, W., Ed.; Noyes Publications: Park Ridge, 1993. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897. Jakob, P.; Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897.
-
(1991)
J. Chem. Phys.
, vol.95
, pp. 2897
-
-
Jakob, P.1
Chabal, Y.J.2
-
19
-
-
0029546382
-
-
Warntjes, M.; Veillard, C.; Ozanam, F.; Chazalviel, J. N. J. Electrochem. Soc. 1995, 142, 4138. Veillard, C.; Warntjes, M.; Ozanam, F.; Chazalviel, J. N. Proceedings of the 4th International Symposium on Advanced Luminescent Materials; Lockwood, D. J., Fauchet, P. M., Koshida, N., Brueck, S. R. J., Eds.; The Electrochemical Society: Pennington, NJ, 1995; p 250.
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 4138
-
-
Warntjes, M.1
Veillard, C.2
Ozanam, F.3
Chazalviel, J.N.4
-
20
-
-
0345796933
-
-
Lockwood, D. J., Fauchet, P. M., Koshida, N., Brueck, S. R. J., Eds.; The Electrochemical Society: Pennington, NJ
-
Warntjes, M.; Veillard, C.; Ozanam, F.; Chazalviel, J. N. J. Electrochem. Soc. 1995, 142, 4138. Veillard, C.; Warntjes, M.; Ozanam, F.; Chazalviel, J. N. Proceedings of the 4th International Symposium on Advanced Luminescent Materials; Lockwood, D. J., Fauchet, P. M., Koshida, N., Brueck, S. R. J., Eds.; The Electrochemical Society: Pennington, NJ, 1995; p 250.
-
(1995)
Proceedings of the 4th International Symposium on Advanced Luminescent Materials
, pp. 250
-
-
Veillard, C.1
Warntjes, M.2
Ozanam, F.3
Chazalviel, J.N.4
-
23
-
-
0001738805
-
-
Delamar, M.; Hitmi, R.; Pinson, J.; Saveant, J. M. J. Am. Chem. Soc. 1992, 114, 5883.
-
(1992)
J. Am. Chem. Soc.
, vol.114
, pp. 5883
-
-
Delamar, M.1
Hitmi, R.2
Pinson, J.3
Saveant, J.M.4
-
24
-
-
4043128921
-
-
in press
-
Allongue, P.; Delamar, M.; Desbat, B.; Fagebaume, O.; Hitmi, R.; Pinson, J.; Saveant, J. M. J. Am. Chem. Soc., in press.
-
J. Am. Chem. Soc.
-
-
Allongue, P.1
Delamar, M.2
Desbat, B.3
Fagebaume, O.4
Hitmi, R.5
Pinson, J.6
Saveant, J.M.7
-
26
-
-
0000583067
-
-
Bourdillon, C.; Demaille, C.; Hitmi, R.; Hoiroux, J.; Pinson, J. J. Electroanal. Chem. 1992, 336, 113.
-
(1992)
J. Electroanal. Chem.
, vol.336
, pp. 113
-
-
Bourdillon, C.1
Demaille, C.2
Hitmi, R.3
Hoiroux, J.4
Pinson, J.5
-
27
-
-
0029614825
-
-
Downard, A. J.; Roddick, A. D.; Bond, A. M. Anal. Chim. Acta 1995, 317, 303.
-
(1995)
Anal. Chim. Acta
, vol.317
, pp. 303
-
-
Downard, A.J.1
Roddick, A.D.2
Bond, A.M.3
-
30
-
-
0344026721
-
-
In the case of SAMs of alkanethiols on Au(111) values of λ = 42 and 34 Å have been reported for photoelectrons of kinetic energy of 1151 and 1402 eV, respectively: see: Bain, C. D.; Whitesides, G. M. J. Phys. Chem. 1989, 93, 1670. We assume that λ is similar for aryl and alkanethiols adlayers.
-
(1989)
J. Phys. Chem.
, vol.93
, pp. 1670
-
-
Bain, C.D.1
Whitesides, G.M.2
-
31
-
-
4043080617
-
-
Bard, A. J., Lund, H., Eds.; Marcel Dekker: New York
-
Stradins, J. P.; Glezer, V. T. G. In Encyclopedia of the Elements; Bard, A. J., Lund, H., Eds.; Marcel Dekker: New York, 1973; Vol. XII, p 78.
-
(1973)
Encyclopedia of the Elements
, vol.12
, pp. 78
-
-
Stradins, J.P.1
Glezer, V.T.G.2
-
32
-
-
0001228437
-
-
Niwano, M.; Katakura, H.; Takeda, Y.; Takawura, Y.; Miyamoto, N.; Hiraiwa, A.; Kunhiro, K. J. Vac. Sci. Technol. 1991, A9, 195. Niwano, M.; Takeda, Y.; Kurita, K.; Miyamoto, N. J. Appl. Phys. 1992, 72, 2488.
-
(1991)
J. Vac. Sci. Technol.
, vol.A9
, pp. 195
-
-
Niwano, M.1
Katakura, H.2
Takeda, Y.3
Takawura, Y.4
Miyamoto, N.5
Hiraiwa, A.6
Kunhiro, K.7
-
33
-
-
36448999890
-
-
Niwano, M.; Katakura, H.; Takeda, Y.; Takawura, Y.; Miyamoto, N.; Hiraiwa, A.; Kunhiro, K. J. Vac. Sci. Technol. 1991, A9, 195. Niwano, M.; Takeda, Y.; Kurita, K.; Miyamoto, N. J. Appl. Phys. 1992, 72, 2488.
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 2488
-
-
Niwano, M.1
Takeda, Y.2
Kurita, K.3
Miyamoto, N.4
-
34
-
-
33646361449
-
-
M'Halba, F.; Pinson, J.; Savéant, J. M. J. Am. Chem. Soc. 1980, 102, 4120.
-
(1980)
J. Am. Chem. Soc.
, vol.102
, pp. 4120
-
-
M'Halba, F.1
Pinson, J.2
Savéant, J.M.3
-
37
-
-
58149325684
-
-
Allongue, P.; Kieling, V.; Gerischer, H. Electrochim. Acta 1995, 40, 1353.
-
(1995)
Electrochim. Acta
, vol.40
, pp. 1353
-
-
Allongue, P.1
Kieling, V.2
Gerischer, H.3
-
38
-
-
0040179911
-
-
Allongue, P.; Costa-Kieling, V.; Gerischer, H. J. Electrochem. Soc. 1993, 140, 1019.
-
(1993)
J. Electrochem. Soc.
, vol.140
, pp. 1019
-
-
Allongue, P.1
Costa-Kieling, V.2
Gerischer, H.3
-
39
-
-
4043141487
-
-
to be published
-
Henry de Villeneuve, C.; Ozanam, F.; Chazalviel, J. N.; Pinson, J.; Allongue, P., to be published.
-
-
-
Henry De Villeneuve, C.1
Ozanam, F.2
Chazalviel, J.N.3
Pinson, J.4
Allongue, P.5
-
40
-
-
4043096304
-
-
note
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Alchemy III software. The final energetic parameters leading to the structure in Figure 6 were as follows: bond 15.9 kcal, angle 41.5 kcal, van der Waals, -48.5 kcal, torsion 9.3 kcal, and oop 0.1 kcal for a total energy 18.3 kcal. Each contribution is related to specific forces. A small oop indicates that rings remain planar and small angle and bond contributions mean that bonds and angles are not distorted with respect to expectations. The negative vdW energy certifies that rings are not in contact with each other.
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