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Volumn 212-213, Issue SPEC., 2003, Pages 649-653

On the re-oxidation of silicon(0 0 1) surfaces modified by self-assembled monolayers

Author keywords

Etching; Self assembled monolayers; Silicon; Surface

Indexed keywords

ETCHING; INFRARED SPECTROSCOPY; MICROELECTRONICS; MOLECULAR ORIENTATION; OXIDATION; PASSIVATION; SELF ASSEMBLY;

EID: 0037534330     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00140-5     Document Type: Conference Paper
Times cited : (4)

References (9)
  • 5
    • 0003371044 scopus 로고
    • Oxygen in silicon
    • F. Shimura (Ed.), Academic Press, New York
    • B. Pajot, Oxygen in silicon, in: F. Shimura (Ed.), Semiconductors and Semimetals, vol. 42, Academic Press, New York, 1994.
    • (1994) Semiconductors and Semimetals , vol.42
    • Pajot, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.