Nanolithography on SiO2/Si with a scanning tunnelling microscope

Nanotechnology

Volumn 14, Issue 11, 2003, Pages

  Iwasaki, Hiroshi ^a   Yoshinobu, Tatsuo ^a   Sudoh, Koichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC FIELDS; ELECTRON BEAMS; HIGH TEMPERATURE EFFECTS; LITHOGRAPHY; NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; SURFACE TOPOGRAPHY; THIN FILMS;

CORE-LEVEL EXCITATIONS; EMISSION CURRENT;

SILICA;

EID: 0345308352     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/11/R01     Document Type: Review

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