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Volumn 7, Issue 2, 1996, Pages 106-109

Selective area oxidation of Si3N4 with an ambient scanning tunneling microscope

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDROFLUORIC ACID; MICROSCOPES; OXIDATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; THIN FILMS;

EID: 0030171555     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/2/002     Document Type: Article
Times cited : (8)

References (19)
  • 3
    • 0041855361 scopus 로고
    • McCord M A and Pease R F W 1986 J. Vac. Sci. Technol. B 4 86; 1987 J. Vac. Sci. Technol. B 5 430; 1988 J. Vac. Sci. Technol. B 6 293
    • (1987) J. Vac. Sci. Technol. B , vol.5 , pp. 430
  • 4
    • 25144496998 scopus 로고
    • McCord M A and Pease R F W 1986 J. Vac. Sci. Technol. B 4 86; 1987 J. Vac. Sci. Technol. B 5 430; 1988 J. Vac. Sci. Technol. B 6 293
    • (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 293


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.