Metal layer mask patterning by force microscopy lithography

Materials Science and Engineering: B

Volumn 112, Issue 2-3 SPEC. ISS., 2004, Pages 194-199

  Filho, H D Fonseca ^a   Mauricio M H P ^a   Ponciano, C R ^a   Prioli, R ^a  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Atomic force microscopy; Masking in lithography; Nano lithography; Nano structures

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFORMATION; ETCHING; MICROSCOPIC EXAMINATION; NONLINEAR SYSTEMS; PATTERN RECOGNITION; PHOTOCHEMICAL REACTIONS; PYROLYSIS; THIN FILMS;

MASKING IN LITHOGRAPHY; NANO-LITHOGRAPHY; NANO-STRUCTURES; SCANNING VELOCITY;

LITHOGRAPHY;

EID: 4344687588     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.05.031     Document Type: Article

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