Nanostructure fabrication using the selective thermal desorption of SiO2 induced by electron beams

Applied Physics Letters

Volumn 69, Issue 5, 1996, Pages 638-640

  Fujita, S ^a   Maruno, S ^a   Watanabe, H ^a   Ichikawa, M ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000144910     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117932     Document Type: Article

References (13)

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