Atomic force microscopy lithography as a nanodevice development technique

Nanotechnology

Volumn 10, Issue 4, 1999, Pages 458-463

  Notargiacomo, A ^a   Foglietti, V ^b   Cianci, E ^c   Capellini, G ^d   Adami, M ^a   Faraci, P ^a   Evangelisti, F ^b,d   Nicolini, C ^e  

^a Polo Nazionale Bioelettronica   (Italy)

^b CNR   (Italy)

^c INAF OSSERVATORIO ASTRONOMICO DI ROMA   (Italy)

^d ROMA TRE UNIVERSITY   (Italy)

^e UNIVERSITY OF GENOA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; MASKS; SURFACE ROUGHNESS;

ATOMIC FORCE MICROSCOPY LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0033313348     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/4/317     Document Type: Article

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