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Volumn 14, Issue 3, 2002, Pages 191-194
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A new scanning probe lithography scheme with a novel metal resist
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DISSOLUTION;
MAGNETRON SPUTTERING;
METALLIC FILMS;
MOLECULAR WEIGHT;
NANOSTRUCTURED MATERIALS;
NANOTECHNOLOGY;
OXIDATION;
PLASMA ETCHING;
POLYMETHYL METHACRYLATES;
SILICON;
SOLUBILITY;
SUBSTRATES;
THIN FILMS;
METAL RESISTS;
SCANNING PROBE LITHOGRAPHY (SPL);
PHOTORESISTS;
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EID: 0037022409
PISSN: 09359648
EISSN: None
Source Type: Journal
DOI: 10.1002/1521-4095(20020205)14:3<191::AID-ADMA191>3.0.CO;2-7 Document Type: Article |
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Times cited : (72)
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References (20)
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