Nano-lithography by electron exposure using an Atomic Force Microscope

Microelectronic Engineering

Volumn 45, Issue 1, 1999, Pages 1-8

  Davidsson, P ^a,c   Lindell, A ^a   Makela T ^b   Paalanen, M ^c   Pekola, J ^a  

^a UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^b VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^c AALTO UNIVERSITY   (Finland)

Author keywords

AFM; Langmuir Blodgett film; Lithography; Tunnel junction

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; LANGMUIR BLODGETT FILMS; SUBSTRATES; THIN FILMS; TUNNEL JUNCTIONS;

VERY THIN RESIST FILMS;

NANOTECHNOLOGY;

EID: 0033076849     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00255-X     Document Type: Article

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