In situ observation and correction of resist patterns in atomic force microscope lithography

Applied Physics Letters

Volumn 72, Issue 19, 1998, Pages 2481-2483

  Shiokawa, Takao ^a   Aoyagi, Yoshinobu ^a   Shigeno, Masatsugu ^b   Namba, Susumu ^c  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

^c NAGASAKI INSTITUTE OF APPLIED SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000265406     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121387     Document Type: Article

References (14)

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