Direct patterning of nanostructures by field-induced deposition from a scanning tunneling microscope tip

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2337-2345

  Houel, A ^a   Tonneau, D ^a   Bonnail, N ^a   Dallaporta, H ^a   Safarov, V I ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DEPOSITION; DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE PHENOMENA;

FIELD INDUCED DEPOSITION; FLUOROHYDRIC ACID; GROWTH MECHANISM;

NANOSTRUCTURED MATERIALS;

EID: 0036883093     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520548     Document Type: Article

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