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Volumn 44, Issue 6 PART 1, 1997, Pages 1826-1833

Revised model of thermally stimulated current in mos capacitors

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CAPACITORS; CARRIER CONCENTRATION; ELECTRIC CURRENT MEASUREMENT; MATHEMATICAL MODELS; RADIATION EFFECTS; RADIATION HARDENING; THERMAL EFFECTS; VOLTAGE MEASUREMENT;

EID: 0031342646     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.658949     Document Type: Article
Times cited : (16)

References (41)
  • 26
    • 0029512516 scopus 로고    scopus 로고
    • IEEE Trans. Nucl. Sei. 42, 1708 (1995); R. E. Stahlbush, Electron Trapping in Buried Oxides During Irradiation at 40 and 300 K,Ibid. 43, 2627 (1996).
    • R. E. Stahlbush and G. A. Brown, Bulk Trap Formation by High Temperature Annealing of Buried Thermal Oxides,IEEE Trans. Nucl. Sei. 42, 1708 (1995); R. E. Stahlbush, Electron Trapping in Buried Oxides During Irradiation at 40 and 300 K,Ibid. 43, 2627 (1996).
    • Bulk Trap Formation by High Temperature Annealing of Buried Thermal Oxides
    • Stahlbush, R.E.1    Brown, G.A.2
  • 30
    • 0030173038 scopus 로고    scopus 로고
    • M. R. Shaneyfelt, P. S. Winokur, D. M. Fleetwood, J. R. Schwank, and R. A. Reber, Jr., IEEE Trans. Nucl. Sei. 43, 865-872 (1996).
    • Effects of Reliability Screens on Charge Trapping,M. R. Shaneyfelt, P. S. Winokur, D. M. Fleetwood, J. R. Schwank, and R. A. Reber, Jr., IEEE Trans. Nucl. Sei. 43, 865-872 (1996).
    • Effects of Reliability Screens on Charge Trapping
  • 36
    • 34648865917 scopus 로고    scopus 로고
    • Ionizing Radiation Effects in MOS Devices & Circuits, edited by T. P. Ma and P. V. Dressendorfer (Wiley, New York, 1989), pp. 87-192, and references therein.
    • 2,in Ionizing Radiation Effects in MOS Devices & Circuits, edited by T. P. Ma and P. V. Dressendorfer (Wiley, New York, 1989), pp. 87-192, and references therein.
    • 2,in
    • McLean, F.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.