Characteristics of Hole Traps in Dry and Pyrogenic Gate Oxides

IEEE Transactions on Nuclear Science

Volumn 31, Issue 6, 1984, Pages 1242-1248

  Shanfield, Zef ^a   Moriwaki, Melvin M ^a  

^a NORTHROP GRUMMAN CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS;

HOLE TRAPS; PYROGENIC GATE OXIDES;

SEMICONDUCTOR DEVICES, MOS;

EID: 0021582067     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1984.4333490     Document Type: Article

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