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Volumn 23, Issue 6, 1976, Pages 1520-1525

Charge yield and dose effects in MOS capacitors at 80 K1

Author keywords

[No Author keywords available]

Indexed keywords

SILICA - RADIATION EFFECTS;

EID: 0017216943     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1976.4328532     Document Type: Article
Times cited : (135)

References (16)
  • 1
    • 84939723263 scopus 로고    scopus 로고
    • This work was supported by the Defense Nuclear Agency and the US Army Materiel Development and Readiness Command.
    • This work was supported by the Defense Nuclear Agency and the US Army Materiel Development and Readiness Command.
  • 5
    • 84939697235 scopus 로고    scopus 로고
    • Hole Transport and Recovery Characteristics of MOS Gate Insulators”
    • ‘This Conference’.
    • F. B. McLean, H. E. Boesch, Jr., J. M. McGarrity, “Hole Transport and Recovery Characteristics of MOS Gate Insulators”, ‘This Conference’.
    • McLean, F.B.1    Boesch, H.E.2    McGarrity, J.M.3
  • 7
    • 84939748820 scopus 로고    scopus 로고
    • Development of Apparatus for Performing Rapid Capacitance-Voltage Measurements on MIS Structures”
    • Harrv Diamond Laboratories TM-7633 ‘to be published’.
    • H. E. Boesch, Jr., “Development of Apparatus for Performing Rapid Capacitance-Voltage Measurements on MIS Structures”, Harrv Diamond Laboratories TM-7633 ‘to be published’.
    • Boesch, H.E.1
  • 11
    • 84939754952 scopus 로고    scopus 로고
    • private communication.
    • G. A. Ausman, Jr., private communication.
    • Ausman, G.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.