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Volumn 41, Issue 6, 1994, Pages 2550-2559

Effects Of Burn-In On Radiation Hardness

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC NETWORK PARAMETERS; ELECTROSTATICS; INTEGRATED CIRCUIT TESTING; INTEGRATED CIRCUITS; INTERFACES (MATERIALS); IRRADIATION; LEAKAGE CURRENTS; MOS DEVICES; THERMAL EFFECTS; THERMAL STRESS; TRANSISTORS;

EID: 0028711776     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.340615     Document Type: Article
Times cited : (53)

References (25)
  • 1
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    • General Specification for Integrated Circuits (Microcircuits) Manufacturing
    • dated 1 June
    • MIL-I-385335B, “General Specification for Integrated Circuits (Microcircuits) Manufacturing,” dated 1 June 1993.
    • (1993) MIL-I-385335B
  • 2
    • 84939333561 scopus 로고
    • Implications of Qualified Manufacturers List Reliability Procedures for Radiation Hardness Assurance
    • Reno, NV, July 16
    • D. R. Alexander, “Implications of Qualified Manufacturers List Reliability Procedures for Radiation Hardness Assurance,” IEEE NSREC Short Course, Reno, NV, July 16, 1990.
    • (1990) IEEE NSREC Short Course
    • Alexander, D.R.1
  • 5
    • 0020246671 scopus 로고
    • Temperature Effects on Failure and Annealing Behavior in Dynamic Random Access Memories
    • N. D. Wilkin and C. T. Self, “Temperature Effects on Failure and Annealing Behavior in Dynamic Random Access Memories,” IEEE Trans. Nucl. Sci. NS29, 1669 (1982).
    • (1982) IEEE Trans. Nucl. Sci , vol.NS29 , pp. 1669
    • Wilkin, N.D.1    Self, C.T.2
  • 6
    • 0022916330 scopus 로고
    • Dose Rate Effects on Total Dose Damage
    • J. L. Azarewicz, “Dose Rate Effects on Total Dose Damage,” IEEE Trans. Nucl. Sci. NS33, 1420 (1986).
    • (1986) IEEE Trans. Nucl. Sci , vol.NS33 , pp. 1420
    • Azarewicz, J.L.1
  • 9
    • 0024170019 scopus 로고
    • The Application of Deep Level Transient Spectroscopy to the Measurement of Radiation-Induced Interface State Spectra
    • C. E. Barnes, T. Zietlow, and K. Nakamura, “The Application of Deep Level Transient Spectroscopy to the Measurement of Radiation-Induced Interface State Spectra,” IEEE Trans. Nucl. Sci. NS35, 1197 (1988).
    • (1988) IEEE Trans. Nucl. Sci , vol.NS35 , pp. 1197
    • Barnes, C.E.1    Zietlow, T.2    Nakamura, K.3
  • 10
    • 0024888848 scopus 로고
    • Time Dependent Annealing of Radiation-Induced Leakage Currents in MOS Devices
    • J. M. Terrell, T. R. Oldham, A. J. Lelis, and H. E. Boesch, Jr., “Time Dependent Annealing of Radiation-Induced Leakage Currents in MOS Devices,” IEEE Trans. Nucl. Sci. NS36, 2205 (1989).
    • (1989) IEEE Trans. Nucl. Sci , vol.NS36 , pp. 2205
    • Terrell, J.M.1    Oldham, T.R.2    Lelis, A.J.3    Boesch, H.E.4
  • 11
    • 0026396455 scopus 로고
    • Effect of Bias on Thermally Stimulated Current (TSC) in Irradiated MOS Devices
    • D. M. Fleetwood, R. A. Reber, Jr., and P. S. Winokur, “Effect of Bias on Thermally Stimulated Current (TSC) in Irradiated MOS Devices,” IEEE Trans. Nucl. Sci. NS38, 1066 (1991).
    • (1991) IEEE Trans. Nucl. Sci. NS38 , vol.NS37 , pp. 1794
    • Fleetwood, D.M.1    Reber, R.A.2    Winokur, P.S.3
  • 12
    • 0001211843 scopus 로고
    • Thermally Stimulated Current Measurements of SiO2 Defect Density and Energy in Irradiated Metal-Oxide-Semiconductor Capacitors
    • R. A. Reber, Jr. and D. M. Fleetwood, “Thermally Stimulated Current Measurements of SiO2 Defect Density and Energy in Irradiated Metal-Oxide-Semiconductor Capacitors,” Rev. Sci. Instrum. 63, 5714 (1992).
    • (1992) Rev. Sci. Instrum , vol.63 , pp. 5714
    • Reber, R.A.1    Fleetwood, D.M.2
  • 16
    • 0001046069 scopus 로고
    • Correlation of Radiation Effects in Transistors and Integrated Circuits
    • F. W. Sexton and J. R. Schwank, “Correlation of Radiation Effects in Transistors and Integrated Circuits,” IEEE Trans. Nucl. Sci. NS32, 3975 (1985).
    • (1985) IEEE Trans. Nucl. Sci , vol.NS32 , pp. 3975
    • Sexton, F.W.1    Schwank, J.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.