Evidence for a Deep Electron Trap and Charge Compensation in Separation by Implanted Oxygen Oxides

IEEE Transactions on Nuclear Science

Volumn 39, Issue 6, 1992, Pages 2114-2120

  Conley, J F ^a   Lenahan, P M ^a   Roitman, P ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000548287     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.211410     Document Type: Article

References (28)

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