Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysis

Nanotechnology

Volumn 25, Issue 50, 2014, Pages

  Guo, Lei ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Atomic layer deposition; Patterning; Selective deposition; Silicon surface; Silylation; UV ozonolysis

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; DEPOSITION; FILM GROWTH; HAFNIUM OXIDES; LIGHT ABSORPTION; MICROELECTRONICS; OZONE; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON WAFERS; SURFACE DEFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

OZONOLYSIS; PATTERNING; SELECTIVE DEPOSITION; SILICON SURFACES; SILYLATIONS;

ATOMIC LAYER DEPOSITION;

EID: 84913535841     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/25/50/504006     Document Type: Article

References (72)

1. Guo L J 2004 J. Phys. D 37 R123
2. Biswas A, Bayer I S, Biris A S, Wang T, Dervishi E and Faupel F 2012 Adv. Colloid Interface Sci. 170 2
3. Kim J and Kim T 2009 JOM 61 17
4. George S M 2010 Chem. Rev. 110 111
5. Levitin G and Hess D W 2011 Annu. Rev. Chem. Biomolec. Eng. 2 299
6. Zaera F 2012 J. Phys. Chem. Lett. 3 1301
7. Hämäläinen J, Ritala M and Leskelä M 2013 Chem. Mater. 26 786
8. Rickerby J and Steinke J H G 2002 Chem. Rev. 102 1525
9. Bhatnagar A, Naik M, Ramaswami S, Spuller M, Armacost M, Perry R, Van Gogh J, Shu J and Miner G 2009 Solid State Technol. 52 16
10. Gambino J P 2011 ECS Trans. 35 687
11. Jeong J, Jun Lee G, Kim J and Choi B 2012 Appl. Phys. Lett. 100 112109
12. Chen Y and Pépin A 2001 Electrophoresis 22 187
13. Gates B D, Xu Q, Stewart M, Ryan D, Willson C G and Whitesides G M 2005 Chem. Rev. 105 1171
14. Innocenzi P, Kidchob T, Falcaro P and Takahashi M 2007 Chem. Mater. 20 607
15. Levy D H, Nelson S F and Freeman D 2009 J. Disp. Technol. 5 484
16. Ellinger C R and Nelson S F 2014 Chem. Mater. 26 1514
17. Rai-Choudhury P (ed) 1997 Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography. Volume 1: Microlithography (Bellingham, WA: SPIE Optical Engineering Press/The Institution of Electrical Engineers)
18. Pease R F and Chou S Y 2008 Proc. IEEE 96 248
19. Childs W R, Motala M J, Lee K J and Nuzzo R G 2005 Langmuir 21 10096
20. Sugimura H, Lee K-H, Sano H and Toyokawa R 2006 Colloids Surf. A 284-285 561
21. Zabetakis D and Dressick W J 2009 ACS Appl. Mater. Interfaces 1 4
22. Prasittichai C, Zhou H and Bent S F 2013 ACS Appl. Mater. Interfaces 5 13391
23. Bao J-Q, Wang Q, Liu X and Ding L 2008 Surf. Sci. 602 2250
24. Park E J, Carroll G T, Turro N J and Koberstein J T 2009 Soft Matter 5 36
25. Lu P, Shi Z and Walker A V 2011 Langmuir 27 13022
26. Lin M-H, Chen C-F, Shiu H-W, Chen C-H and Gwo S 2009 J. Am. Chem. Soc. 131 10984
27. George A, Maijenburg A W, Maas M G, Blank D H A and ten Elshof J E 2011 Langmuir 27 12235
28. Aureau D, Morscheidt W, Etcheberry A, Vigneron J, Ozanam F, Allongue P and Chazalviel J N 2009 J. Phys. Chem. C 113 14418
29. Yun D-J and Rhee S-W 2010 J. Electrochem. Soc. 157 H349
30. Unger W E S, Lippitz A, Gross T, Friedrich J F, Wöll C and Nick L 1999 Langmuir 15 1161
31. Chen G-S, Chen S-T, Chen Y W and Hsu Y-C 2013 Langmuir 29 511
32. Lercel M J, Whelan C S, Craighead H G, Seshadri K and Allara D L 1996 J. Vac. Sci. Technol. B 14 4085
33. Lee W and Prinz F B 2009 J. Electrochem. Soc. 156 G125
34. Park K J, Doub J M, Gougousi T and Parsons G N 2005 Appl. Phys. Lett. 86 051903
35. Färm E, Kemell M, Ritala M and Leskelä M 2006 Chem. Vapor Depos. 12 415
36. Sinha A, Hess D W and Henderson C L 2006 J. Electrochem. Soc. 153 G465
37. Liu J, Mao Y, Lan E, Banatao D R, Forse G J, Lu J, Blom H-O, Yeates T O, Dunn B and Chang J P 2008 J. Am. Chem. Soc. 130 16908
38. Jiang X and Bent S F 2009 J. Phys. Chem. C 113 17613
39. Deyhimi F and Coles J A 1982 Helv. Chim. Acta 65 1752
40. Flinn D H, Guzonas D A and Yoon R H 1994 Colloids Surf. A 87 163
41. Schmohl A, Khan A and Hess P 2004 Superlattices Microstruct. 36 113
42. Hong J and Zaera F 2012 J. Am. Chem. Soc. 134 13056
43. Vig J R 1985 J. Vac. Sci. Technol. A 3 1027
44. Hook D A, Olhausen J A, Krim J and Dugger M T 2010 J. Microelectromech. Syst. 19 1292
45. Chen S-F, Chang C-Y and Ku Y-C 2010 Proc. of SPIE 7639: Advances in Resist Materials and Processing Technology XXVII 76391A
46. Alam E A et al 2011 J. Appl. Phys. 109 084511
47. Uosaki K, Quayum M E, Nihonyanagi S and Kondo T 2004 Langmuir 20 1207
48. McIntire T M, Ryder O and Finlayson-Pitts B J 2009 J. Phys. Chem. C 113 11060
49. Ouyang M, Yuan C, Muisener R J, Boulares A and Koberstein J T 2000 Chem. Mater. 12 1591
50. Egitto F D and Matienzo L J 2006 J. Mater. Sci. 41 6362
51. Nakamura K, Nonaka H, Kameda N, Nishiguchi T and Ichimura S 2008 Japan. J. Appl. Phys. 47 7349
52. Heo J, Lee S Y, Eom D, Hwang C S and Kim H J 2008 Electrochem. Solid State Lett. 11 G5
53. Hollinger G, Gallet D, Gendry M, Besland M P and Joseph J 1991 Appl. Phys. Lett. 59 1617
54. Whelan C M, Le Q T, Cecchet F, Satta A, Pireaux J J, Rudolf P and Maex K 2004 Electrochem. Solid State Lett. 7 F8
55. Heo J, Eom D and Kim H J 2007 Microelectron. Eng. 84 2188
56. Matero R, Rahtu A, Ritala M, Leskelä M and Sajavaara T 2000 Thin Solid Films 368 1
57. Kelly M J, Han J H, Musgrave C B and Parsons G N 2005 Chem. Mater. 17 5305
58. Zaera F 2013 Coord. Chem. Rev. 257 3177
59. Kern W 1990 J. Electrochem. Soc. 137 1887
60. Seah M P and Dench W A 1979 Surf. Interface Anal. 1 2
61. Keinosuke H and Hirofumi M 1983 Spectrosc. Lett. 16 717
62. Queeney K T, Herbots N, Shaw J M, Atluri V and Chabal Y J 2004 Appl. Phys. Lett. 84 493
63. Nakamura K, Nonaka H, Kameda N, Nishiguchi T and Ichimura S 2008 J. Vac. Soc. Japan 51 224
64. Hermansson K, Lindberg U, Hok B and Palmskog G 1991 Transducers'91 Int. Conf. on Solid-State Sensors and Actuators (San Francisco, CA, USA, June 24-28) 193-5
65. Franssila S 2010 Introduction to Microfabrication (New York: Wiley)
66. Maccarini M, Himmelhaus M, Stoycheva S and Grunze M 2005 Appl. Surf. Sci. 252 1941
67. Chen R, Kim H, McIntyre P C and Bent S F 2005 Chem. Mater. 17 536
68. Calvert J G, James J N and Pitts N Jr 1966 Photochemistry (New York: Wiley)
69. Clark T, Ruiz J D, Fan H, Brinker C J, Swanson B I and Parikh A N 2000 Chem. Mater. 12 3879
70. Chou M-S and Chang K-L 2007 Chemosphere 69 697
71. Pillai S and Pai R K 2009 Ultramicroscopy 109 161
72. Renault O, Samour D, Damlencourt J-F, Blin D, Martin F, Marthon S, Barrett N T and Besson P 2002 Appl. Phys. Lett. 81 3627