Controlled oxidation of alkyl monolayers grafted onto flat Si(111) in an oxygen plasma of low power density

Journal of Physical Chemistry C

Volumn 113, Issue 32, 2009, Pages 14418-14428

  Aureau, D ^a   Morscheidt, W ^b   Etcheberry, A ^c   Vigneron, J ^c   Ozanam, F ^a   Allongue, P ^a   Chazalviel, J N ^a  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^b PSL RESEARCH UNIVERSITY   (France)

^c UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; INFRARED SPECTROSCOPY; KETONES; MOLECULES; MONOLAYERS; OXIDATION; OXYGEN; PLASMA APPLICATIONS; SILICON COMPOUNDS;

CONTROLLED OXIDATIONS; MULTIPLE INTERNAL REFLECTIONS; ORGANIC MONOLAYERS; ORIENTED SILICON; OXYGEN PLASMA TREATMENTS; QUASI-STEADY STATE; REACTION MECHANISM; SELECTIVE OXIDATION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 68749090898     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp903892z     Document Type: Article

References (43)

1. Jaynes, W. F.; Boyd, S. A. Clays Clay Miner. 1991, 39, 428-436.
2. Abbott, N. L.; Folkers, J. P.; Whitesides, G. M. Science 1992, 257, 1380-1382.
3. Ando, M.; Kawasaki, M.; Imazeki, S.; Sasaki, H.; Kamata, T. Appl. Phys. Lett. 2004, 85, 1849-1851.
4. Nüesch, F.; Si-Ahmed, L.; François, B.; Zuppiroli, L. Adv. Mater. 1997, 9, 222-225.
5. Rider, D. A.; Harris, K. D.; Wang, D.; Bruce, J.; Fleischauer, M. D.; Tucker, R. T.; Brett, M. J.; Buriak, J. M. Appl. Mater. Interf. 2009, 1, 279-287.
6. Henry de Villeneuve, C.; Pinson, J.; Bernard, M. C.; Allongue, P. J. Phys. Chem. B 1997, 101, 2415-2420.
7. Calhoun, M. F.; Sanchez, J.; Olaya, D.; Gesherson, M. E.; Podzorov, V. Nat. Mater. 2008, 7, 84-89.
8. Rusmini, F.; Zhong, Z.; Feijen, J. Biomacromolecules 2007, 8, 1775-1789.
9. Chan, C.-M.; Ko, T.-M.; Hiraoka, H. Surf. Sci. Rep. 1996, 24, 1-54.
10. Lehocký, M.; Drnovská, H.; Lapčikova, B.; Barros-Timmons, A. M.; Trindade, T.; Zembala, M.; Lapčik Jr, L. Colloids Surf., A 2003, 222, 125-131.
11. Arefi-Khonsari, F.; Tatoulian, M.; Bretagnol, F.; Bouloussa, O.; Rondelez, F. Surf. Coat. Technol. 2005, 200, 14-20.
12. Siow, K. S.; Britcher, L.; Kumar, S.; Griesser, H. J. Plasma Process. Polym. 2006, 3, 392-418.
13. Kim, M. S.; Khang, G.; Lee, H. B. Prog. Polym. Sci. 2008, 33, 138-164.
14. Wang, M.-C.; Liao, J.-D.; Weng, C.-C.; Klauser, R.; Shaporenko, A.; Grunze, M.; Zharnikov, M. Langmuir 2003, 19, 9774-9780.
15. Weng, C.-C.; Liao, J.-D.; Wu, Y.-T.; Wang, M.-C.; Klauser, R.; Grunze, M.; Zharnikov, M. Langmuir 2004, 20, 10093-10099.
16. Unger, W. E. S.; Lippitz, A.; Gross, T.; Friedrich, J. F.; Woll, C.; Nick, L. Langmuir 1999, 15, 1161-1166.
17. Xue, C. Y.; Yang, K. L. Langmuir 2007, 23, 5831-5835.
18. Delorme, N.; Bardeau, J.-F.; Bulou, A.; Poncin-Epaillard, F. Thin Solid Films 2006, 496, 612-618.
19. Gorostiza, P.; Henry de Villeneuve, C.; Sun, Q. Y.; Sanz, F.; Wallart, X.; Boukherroub, R.; Allongue, P. J. Phys. Chem. B 2006, 110, 5576-5585.
20. Wayner, D. D. M.; Wolkow, R. A. J. Chem. Soc., Perkin Trans. 2002, 2, 23-34.
21. Fellah, S.; Teyssot, A.; Ozanam, F.; Chazalviel, J.-N.; Vigneron, J.; Etcheberry, A. Langmuir 2002, 18, 5851-5860.
22. Munford, M. L.; Cortès, R.; Allongue, P. Sens. Mater. 2001, 13, 259-269.
23. Sieval, A. B.; Demirel, A. L.; Nissink, J. W. M.; Linford, M. R.; van der Maas, J. H.; de Jeu, W. H.; Zuilhof, H.; Sudhölter, E. J. R. Langmuir 1998, 14, 1759-1768.
24. Tajima, S.; Komvopoulos, K. J. Phys. Chem. B 2005, 109, 17623-17629.
25. Chazalviel, J.-N.; da Fonseca, C.; Ozanam, F. J. Electrochem. Soc. 1998, 145, 964-973.
26. Faucheux, A.; Gouget-Laemmel, A.-C.; Henry de Villeneuve, C.; Boukherroub, R.; Ozanam, F.; Allongue, P.; Chazalviel, J.-N. Langmuir 2006, 22, 153-162.
27. Morscheidt, W.; Hassouni, K.; Bauduin, N.; Arefi-Khonsari, F.; Amouroux, J. Plasma Chem. Plasma Process. 2003, 23, 117-140.
28. Roberson, G.; Roberto, M.; Verboncoeur, J.; Verdonck, P. Brazilian J. Phys. 2007, 37, 457-465.
29. Patino, P.; Hernandez, F. E.; Rondon, S. Plasma Chem. Plasma Process. 1995, 15, 159-171.
30. Normand, F.; Granier, A.; Leprince, P.; Marec, J.; Shi, M. K.; Clouet, F. Plasma Chem. Plasma Process. 1995, 15, 173-198.
31. Médard, N.; Soutif, J. C.; Poncin-Epaillard, F. Surf. Coat. Technol. 2002, 160, 197-205.
32. Belmonte, T.; Pintassilgo, C. D.; Czerwiec, T.; Henrion, G.; Hody, V.; Thiebaut, J. M.; Loureiro, J. Surf. Coat. Technol. 2005, 200, 26-30.
33. Tang, S.; Choi, H. S. J. Phys. Chem. C 2008, 112, 4712-4718.
34. Joong Kim, K.; Park, K. T.; Lee, J. W. Thin Solid Films 2006, 500, 356-359.
35. Berjoan, R.; Beche, E.; Roger, J. A.; Dupuy, C. H. S. J. High Temp. Chem. Proc. 1994, 3, 555-565.
36. da Fonseca, C.; Ozanam, F.; Chazalviel, J.-N. Surf. Sci. 1996, 365, 1-14.
37. Galabov, B.; Bobadova-Parvanova, P.; Dudev, T. J. Mol. Struct. 1997, 406, 119-125.
38. Castiglioni, C.; Gussoni, M. J. Mol. Struct. 2000, 521, 1-18.
39. Wallart, X.; Henry de Villeneuve, C.; Allongue, P. J. Am. Chem. Soc. 2005, 127, 7871-7878.
40. March, J. Advanced Organic Chemistry (Reactions, Mechanisms and Structure), 4th Edition; Wiley: New York, 1992.
41. NIST Chemistry WebBook 2009, http://www.nist.gov/srd/ (accessed April, 2009).
42. Cai, W.; Peck, J. R.; van der Weide, D. W.; Hamers, R. J. Biosens. Bioelectron. 2004, 19, 1013-1019.
43. Moraillon, A.; Gouget-Laemmel, A.-C.; Ozanam, F.; Chazalviel, J.-N. J. Phys. Chem. C 2008, 112, 7158-7167.