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Volumn 109, Issue 2, 2009, Pages 161-166
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Controlled growth and formation of SAMs investigated by atomic force microscopy
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Author keywords
Atomic force microscopy (AFM); Self assembled monolayers; Surfaces; Thin films
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Indexed keywords
ADSORPTION;
ATOMIC FORCE MICROSCOPY;
ATOMIC PHYSICS;
ATOMS;
CONTACT ANGLE;
ELECTRON ENERGY LEVELS;
GROWTH (MATERIALS);
HUMIDITY CONTROL;
HYDROCHLORIC ACID;
MONOLAYERS;
SILANES;
THIN FILMS;
WATER CONTENT;
ADSORPTION TIMES;
ATOMIC FORCE MICROSCOPY (AFM);
BIOLOGICAL APPLICATIONS;
CHLOROSILANE;
CONTROLLED GROWTHS;
EXPANSION PROCESSES;
GROWTH MECHANISMS;
ISLAND MORPHOLOGIES;
MONOLAYER FORMATIONS;
MONOLAYER GROWTHS;
MONOLAYER THICKNESSES;
OCTADECYLSILOXANE;
OCTADECYLTRICHLOROSILANE;
OCTADECYLTRIMETHOXY SILANES;
OVER SURFACES;
REACTIVE SILANES;
SIMPLE METHODS;
SLOW GROWTH RATES;
STRAIGHTFORWARD METHODS;
SURFACE COVERAGES;
SELF ASSEMBLED MONOLAYERS;
HYDROCHLORIC ACID;
OCTADECYLSILOXANE;
OCTADECYLTRICHLOROSILANE;
OCTADECYLTRIMETHOXYSILANE;
SELF ASSEMBLED MONOLAYER;
SILANE DERIVATIVE;
UNCLASSIFIED DRUG;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
ELLIPSOMETRY;
GROWTH RATE;
GROWTH REGULATION;
HYDROLYSIS;
WATER CONTENT;
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EID: 57749174538
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2008.10.002 Document Type: Article |
Times cited : (14)
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References (37)
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