Site-selective electroless metallization on porous organosilica films by multisurface modification of alkyl monolayer and vacuum plasma

Langmuir

Volumn 29, Issue 2, 2013, Pages 511-518

  Chen, Giin Shan ^a   Chen, Sung Te ^b   Chen, Yenying W ^a   Hsu, Yen Che ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b HSIUPING INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL MONOLAYERS; BONDING STRUCTURE; CARBOXYLIC GROUP; CHEMICAL VAPOR DEPOSITED; ELECTROLESS METALLIZATION; KEY FACTORS; MULTI-SURFACE; OCTADECYLTRICHLOROSILANE; ORGANOSILICAS; PLASMA DAMAGE; PLASMA DIAGNOSIS; PLASMA PARAMETER; SAMS; SEEDING PROCESS; SITE SELECTIVE;

AUTOMOBILE MANUFACTURE; CARBON FILMS; CHEMICAL BONDS; COPPER; ELECTRIC PROPERTIES; EXCITONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL GROUPS; METALLIZING; NITROGEN PLASMA; OXYGENATION; PHOTODEGRADATION; SELF ASSEMBLED MONOLAYERS; SILICA; VACUUM; WATER ABSORPTION;

PLASMA DEPOSITION;

EID: 84872509700     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la303473r     Document Type: Article

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