Multilength-scale chemical patterning of self-assembled monolayers by spatially controlled plasma exposure: Nanometer to centimeter range

Journal of the American Chemical Society

Volumn 131, Issue 31, 2009, Pages 10984-10991

  Lin, Meng Hsien ^a   Chen, Chi Fan ^a   Shiu, Hung Wei ^a,b   Chen, Chia Hao ^b   Gwo, Shangjr ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR PLASMAS; CARBOXYL GROUPS; CHEMICAL CONVERSIONS; CHEMICAL PATTERNING; COLLOID NANOPARTICLES; CONTACT MASKS; ELASTOMERIC POLY(DIMETHYLSILOXANE); FEATURE SIZES; LOW POWER; OCTADECYLTRICHLOROSILANE MONOLAYERS; OR CHANNELS; PLASMA EXPOSURE; PLASMA-INDUCED; POLAR FUNCTIONAL GROUPS; SAMS; SCANNING KELVIN PROBE MICROSCOPY; SCANNING PHOTOELECTRON MICROSCOPY; SEM; SI SURFACES; SURFACE FUNCTIONAL GROUPS; SURFACE FUNCTIONALITIES; TERMINAL GROUPS; XPS;

ADSORPTION; ANGLE MEASUREMENT; CONTACT ANGLE; ELECTRON ENERGY LEVELS; FUNCTIONAL GROUPS; NANOPARTICLES; PHOTOIONIZATION; PHOTONS; PLASMAS; SCANNING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SILANES; SILICONES;

X RAY PHOTOELECTRON SPECTROSCOPY;

ALDEHYDE; CARBOXYL GROUP; DIMETICONE; ELASTOMER; FUNCTIONAL GROUP; HYDROXYL GROUP; SELF ASSEMBLED MONOLAYER; SILANE DERIVATIVE; SILICON;

ADSORPTION; ARTICLE; CHEMICAL MODIFICATION; COLLOID; CONTACT ANGLE; CONTROLLED STUDY; ELECTRON MICROSCOPY; HYDROXYLATION; LIGHT EXPOSURE; MOLECULAR MECHANICS; OXIDATION; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 68249142758     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja901619h     Document Type: Article

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