SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 157, Issue 3, 2010, Pages

Plasma damage on the OTS treated SiO2 substrate in the source/drain electrode deposition process

(2) Yun, Dong Jin a Rhee, Shi Woo a

a Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; ELECTRICAL PROPERTY; EVAPORATION DEPOSITION; LIFT-OFF METHODS; OCTADECYLTRICHLOROSILANE MONOLAYERS; PATTERNING METHODS; PENTACENE THIN FILM TRANSISTORS; PENTACENES; PERFORMANCE IMPROVEMENTS; PLASMA DAMAGE; SI SUBSTRATES; SOURCE/DRAIN ELECTRODES; THERMAL DAMAGE;

DEGRADATION; DEPOSITION; ELECTRIC PROPERTIES; MONOLAYERS; PLASMAS; SEMICONDUCTING ORGANIC COMPOUNDS; SILICON COMPOUNDS; THERMAL EVAPORATION; THIN FILM TRANSISTORS; VAPORS; EVAPORATION; PHOTORESISTS;

PLASMA DEPOSITION; DEPOSITION;

EID: 76349103305 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3281185 Document Type: Article

Times cited : (6)

References (14)

1
- 55849100026
- JMACEP 0959-9428, 10.1039/b805884a
- S. W. Rhee and D. J. Yun, J. Mater. Chem. JMACEP 0959-9428, 18, 5437 (2008). 10.1039/b805884a
- (2008) J. Mater. Chem. , vol.18 , pp. 5437
- Rhee, S.W.¹ Yun, D.J.²

2
- 34248339106
- Electron and ambipolar transport in organic field-effect transistors
- DOI 10.1021/cr0501543
- J. Zaumseil and H. Sirringhaus, Chem. Rev. (Washington, D.C.) CHREAY 0009-2665, 107, 1296 (2007). 10.1021/cr0501543 (Pubitemid 46736540)
- (2007) Chemical Reviews , vol.107 , Issue.4 , pp. 1296-1323
- Zaumseil, J.¹ Sirringhaus, H.²

3
- 34248348214
- Organic semiconducting oligomers for use in thin film transistors
- DOI 10.1021/cr0501386
- A. R. Murphy and J. M. J. Fechet, Chem. Rev. (Washington, D.C.) CHREAY 0009-2665, 107, 1066 (2007). 10.1021/cr0501386 (Pubitemid 46736534)
- (2007) Chemical Reviews , vol.107 , Issue.4 , pp. 1066-1096
- Murphy, A.R.¹ Frechet, J.M.J.²

4
- 0345979435
- CHREAY 0009-2665, 10.1021/cr9502357
- A. Ulman, Chem. Rev. (Washington, D.C.) CHREAY 0009-2665, 96, 1533 (1996). 10.1021/cr9502357
- (1996) Chem. Rev. (Washington, D.C.) , vol.96 , pp. 1533
- Ulman, A.¹

5
- 18044398972
- Self-assembled monolayers of thiolates on metals as a form of nanotechnology
- DOI 10.1021/cr0300789
- J. C. Love, L. A. Estroff, J. K. Kriebel, R. G. Nuzzo, and G. M. Whitesides, Chem. Rev. (Washington, D.C.) CHREAY 0009-2665, 105, 1103 (2005). 10.1021/cr0300789 (Pubitemid 40600878)
- (2005) Chemical Reviews , vol.105 , Issue.4 , pp. 1103-1169
- Love, J.C.¹ Estroff, L.A.² Kriebel, J.K.³ Nuzzo, R.G.⁴ Whitesides, G.M.⁵

6
- 20744459761
- Threshold voltage shift in organic field effect transistors by dipole monolayers on the gate insulator
- DOI 10.1063/1.1810205
- K. P. Pernstich, S. Haas, D. Oberhoff, C. Goldmann, D. J. Gundlach, B. Batlogg, A. N. Rashid, and G. Schitter, J. Appl. Phys. JAPIAU 0021-8979, 96, 6431 (2004). 10.1063/1.1810205 (Pubitemid 44938224)
- (2004) Journal of Applied Physics , vol.96 , Issue.11 , pp. 6431-6438
- Pernstich, K.P.¹ Haas, S.² Oberhoff, D.³ Goldmann, C.⁴ Gundlach, D.J.⁵ Batlogg, B.⁶ Rashid, A.N.⁷ Schitter, G.⁸

7
- 0037245896
- JAPIAU 0021-8979, 10.1063/1.1525068
- D. KnipR. A. Street, A. Volkel, and J. Ho, J. Appl. Phys. JAPIAU 0021-8979, 93, 347 (2003). 10.1063/1.1525068
- (2003) J. Appl. Phys. , vol.93 , pp. 347
- Knipp, D.¹ Street, R.A.² Volkel, A.³ Ho, J.⁴

8
- 69249181368
- APPLAB 0003-6951, 10.1063/1.3206665
- J. J. Jang, S. H. Kim, J. H. Hwang, S. J. Nam, C. W. Yang, D. S. Chung, and C. E. Park, Appl. Phys. Lett. APPLAB 0003-6951, 95, 073302 (2009). 10.1063/1.3206665
- (2009) Appl. Phys. Lett. , vol.95 , pp. 073302
- Jang, J.J.¹ Kim, S.H.² Hwang, J.H.³ Nam, S.J.⁴ Yang, C.W.⁵ Chung, D.S.⁶ Park, C.E.⁷

9
- 0031555234
- JAPNAB 0021-8995, 10.1002/(SICI)1097-4628(19971205)66:10<1855::AID- APP3>3.0.CO;2-M
- B. Denq, W. Chiu, and K. LJ. Appl. Polym. Sci. JAPNAB 0021-8995, 66, 1855 (1998). 10.1002/(SICI)1097-4628(19971205)66:10<1855::AID-APP3>3.0.CO;2-M
- (1998) J. Appl. Polym. Sci. , vol.66 , pp. 1855
- Denq, B.¹ Chiu, W.² Lin, K.³

10
- 0036813552
- Regulation of the surface potential of silicon substrates in micrometer scale with organosilane self-assembled monolayers
- DOI 10.1021/la011707h
- K. Hayashi, N. Saito, H. Sugimura, O. Takai, and N. Nakagiri, Langmuir LANGD5 0743-7463, 18, 7469 (2002). 10.1021/la011707h (Pubitemid 35383164)
- (2002) Langmuir , vol.18 , Issue.20 , pp. 7469-7472
- Hayashi, K.¹ Saito, N.² Sugimura, H.³ Takai, O.⁴ Nakagiri, N.⁵

11
- 0034620411
- Micropatterning of alkyl- and fluoroalkylsilane self-assembled monolayers using vacuum ultraviolet light
- DOI 10.1021/la990953e
- H. Sugimura, K. Ushiyama, A. Hozumi, and O. Takai, Langmuir LANGD5 0743-7463, 16, 885 (2000). 10.1021/la990953e (Pubitemid 30562185)
- (2000) Langmuir , vol.16 , Issue.3 , pp. 885-888
- Sugimura, H.¹ Ushiyama, K.² Hozumi, A.³ Takai, O.⁴

12
- 0000225324
- Plasma etching with self-assembled monolayer masks for nanostructure fabrication
- DOI 10.1116/1.580347
- M. J. Lercel, H. G. Craighead, A. N. Parikh, K. Seshadri, and D. L. Alllara, J. Vac. Sci. Technol. A JVTAD6 0734-2101, 14, 1844 (1996). 10.1116/1.580347 (Pubitemid 126082124)
- (1996) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.14 , Issue.3 PART 2 , pp. 1844-1849
- Lercel, M.J.¹ Craighead, H.G.² Parikh, A.N.³ Seshadri, K.⁴ Allara, D.L.⁵

13
- 0031272709
- JPCBFK 1089-5647, 10.1021/jp970562d
- L. Dai, H. J. Criesser, and A. W. H. Mau, J. Phys. Chem. B JPCBFK 1089-5647, 101, 9548 (1997). 10.1021/jp970562d
- (1997) J. Phys. Chem. B , vol.101 , pp. 9548
- Dai, L.¹ Criesser, H.J.² Mau, A.W.H.³

14
- 28044435644
- THSFAP 0040-6090, 10.1016/j.tsf.2005.08.321
- S. A. Kulkarni, S. A. Mirji, A. B. Mandale, and K. P. Vijayamohanan, Thin Solid Films THSFAP 0040-6090, 496, 420 (2006). 10.1016/j.tsf.2005.08.321
- (2006) Thin Solid Films , vol.496 , pp. 420
- Kulkarni, S.A.¹ Mirji, S.A.² Mandale, A.B.³ Vijayamohanan, K.P.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.