Sealing of Porous Low-k Dielectrics Ellipsometric Porosimetry Study of UV-O3 Oxidized SiOxCy Films

Electrochemical and Solid-State Letters

Volumn 7, Issue 2, 2004, Pages

  Whelan, Caroline M ^a   Le, Quoc Toan ^a   Cecchet, Francesca ^b   Satta, Alessandra ^a   Pireaux, Jean Jacques ^b   Rudolf, Petra ^b   Maex, Karen ^a,c  

^a IMEC   (Belgium)

^b UNIVERSITY OF NAMUR   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FREE RADICALS; HEAT LOSSES; INSULATING MATERIALS; OXIDATION; PORE SIZE; POROSITY; REFRACTIVE INDEX; SEALING (CLOSING); SILICA; SPECTROMETRY;

INTERCONNECTIVITY; POROUS MATRIX;

DIELECTRIC MATERIALS;

EID: 1642585924     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1633512     Document Type: Article

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