Selective electroless deposition of copper on organic thin films with improved morphology

Langmuir

Volumn 27, Issue 21, 2011, Pages 13022-13028

  Lu, Peng ^a   Shi, Zhiwei ^a   Walker, Amy V ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLATE COMPLEXES; COPPER DEPOSITION; COPPER LAYER; DEPOSITED FILMS; FUNCTIONALIZED; ORGANIC FILMS; ORGANIC LAYERS; ORGANIC THIN FILMS; PHOTOPATTERNED; SAMS; SEED LAYER;

ADDITIVES; CARBOXYLATION; COMPLEXATION; COPPER COMPOUNDS; COPPER DEPOSITS; DEPOSITS; MOLECULAR ELECTRONICS; MORPHOLOGY; POSITIVE IONS; SELF ASSEMBLED MONOLAYERS;

COPPER;

EID: 80054880178     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la202839z     Document Type: Article

References (49)

1. Friend, R.; Burroughes, J.; Shimoda, T. Phys. World 1999, 35-40
2. Friend, R. H.; Gymer, R. W.; Holmes, A. B.; Burroughes, J. H.; Marks, R. N.; Taliani, C.; Bradley, D. D. C.; Dos Santos, D. A.; Brédas, J. L.; Lögdlund, M.; Salaneck, W. R. Nature 1999, 397, 121-128
3. Molecular Nanoelectronics; Reed, M. A.; Lee, T., Eds.; American Scientific Publishers: Stevenson Ranch, CA, 2003.
4. Geetha, M.; Singh, A. K.; Asokamani, R.; Gogia, A. K. Prog. Surf. Sci. 2009, 54, 397-425
5. Haick, H.; Cahen, D. Prog. Surf. Sci. 2008, 83, 217-261
6. Akkerman, H. B.; de Boer, B. J. Phys.: Condens. Matter 2008, 20, 013001
7. Fisher, G. L.; Hooper, A. E.; Opila, R. L.; Allara, D. L.; Winograd, N. J. Phys. Chem. B 2000, 104, 3267-3273
8. Hooper, A.; Fisher, G. L.; Konstadinidis, K.; Jung, D.; Nguyen, H.; Opila, R.; Collins, R. W.; Winograd, N.; Allara, D. L. J. Am. Chem. Soc. 1999, 121, 8052-8064
9. Nagy, G.; Walker, A. V. J. Phys. Chem. B 2006, 110, 12543-12554
10. Nagy, G.; Walker, A. V. J. Phys. Chem. C 2007, 111, 8543-8556
11. Walker, A. V.; Tighe, T. B.; Cabarcos, O. M.; Reinard, M. D.; Haynie, B. C.; Uppili, S.; Winograd, N.; Allara, D. L. J. Am. Chem. Soc. 2004, 126, 3954-3963
12. Walker, A. V.; Tighe, T. B.; Haynie, B. C.; Uppili, S.; Allara, D. L.; Winograd, N. J. Phys. Chem. B 2005, 109, 11263-11272
13. Vilan, A.; Cahen, D. Adv. Funct. Mater. 2002, 12, 795-807
14. Weckenmann, U.; Mittler, S.; Krämer, S.; Aliganga, A. K. A.; Fischer, R. A. Chem. Mater. 2004, 16, 621-628
15. Winter, C.; Weckenmann, U.; Fischer, R. A.; Käshammer, J.; Scheumann, V.; Mittler, S. Chem. Vap. Deposition 2000, 6, 199-205
16. Wohlfart, P.; Wei, J.; Käshammer, J.; Winter, C.; Scheumann, V.; Fischer, R. A.; Mittler-Neher, S. Thin Solid Films 1999, 340, 274-279
17. Lu, P.; Demirkan, K.; Opila, R. L.; Walker, A. V. J. Phys. Chem. C 2007, 112, 2091-2098
18. Seitz, O.; Dai, M.; Aguirre-Tostado, F. S.; Wallace, R. M.; Chabal, Y. J. J. Am. Chem. Soc. 2009, 131, 18159-18167
19. Paunovic, M. In Modern Electroplating, 4 th ed.; Schlesinger, M.; Paunovic, M., Eds.; John Wiley & Sons: New York, 2000; pp 645-665.
20. Adriacacos, P. C. Interface 1999, 8, 32-37
21. Zaporojtchenko, V.; Strunksus, T.; Behnke, K.; von Bechtolsheim, C.; Kiene, M.; Faupel, F. J. Adhes. Sci. Technol. 2000, 14, 467-490
22. Opila, R. L.; Eng, J., Jr. Prog. Surf. Sci. 2002, 69, 125-163
23. Dake, L. S.; King, D. E.; Czanderna, A. W. Solid State Sci. 2002, 2, 781-789
24. Modern Electroplating, 4 th ed.; Schlesinger, M.; Paunovic, M., Eds.; John Wiley & Sons: New York, 2000.
25. Zangmeister, C. D.; van Zee, R. D. Langmuir 2003, 19, 8065-8068
26. Hozumi, A.; Asakura, S.; Fuwa, A.; Shirahata, N.; Kameyama, T. Langmuir 2005, 21, 8234-8242
27. Lu, P.; Walker, A. V. Langmuir 2007, 23, 12577-12582
28. Garno, J. C.; Zangmeister, C. D.; Batteas, J. D. Langmuir 2007, 23, 7874-7879
29. Czanderna, A. W.; King, D. E.; Spaulding, D. J. Vac. Sci. Technol., A 1991, 9, 2607-2613
30. Shriver, D. F.; Atkins, P. W.; Langford, C. H. Inorganic Chemistry; Oxford University Press: Oxford, 1992.
31. Paunovic, M.; Arndt, R. J. Electrochem. Soc. 1983, 130, 794-799
32. Schoenberg, L. N. J. Electrochem. Soc. 1972, 119, 1491-1493
33. Lin, Y.-M.; Yen, S.-C. Appl. Surf. Sci. 2001, 178, 116-126
34. Allara, D. L.; Nuzzo, R. G. Langmuir 1985, 1, 45-52
35. Fisher, G. L.; Hooper, A. E.; Opila, R. L.; Jung, D. R.; Allara, D. L.; Winograd, N. J. Electron Spectrosc. Relat. Phenom. 1998, 98-99, 139-148
36. Nuzzo, R. G.; Allara, D. L. J. Am. Chem. Soc. 1983, 105, 4481-4483
37. Nuzzo, R. G.; Dubios, L. H.; L., A. D. J. Am. Chem. Soc. 1990, 112, 558-569
38. ToF-SIMS: Surface Analysis by Mass Spectrometry; Vickerman, J. C.; Briggs, D., Eds.; IM Publications and Surface Spectra Ltd.: Chichester and Manchester, UK, 2001.
39. Masoud, M. S.; Soayed, A. A.; Ali, A. E. Spectrochim. Acta, Part A 2004, 60, 1907-1915
40. Harkins, T. R.; Freiser, H. J. Am. Chem. Soc. 1958, 80, 1132-135
41. Pavelka, M.; Shukla, M. K.; Leszczynski, J.; Burda, J. V. J. Phys. Chem. A 2007, 112, 256-267
42. Farias, P. A. M.; de Luca Rebello Wagener, A.; Castro, A. A. Talanta 2001, 55, 281-290
43. Sletten, E. Chem. Commun. 1967, 1119-1120
44. Lancelot, G.; Hélène, C. Proc. Natl. Acad. Sci. U.S.A. 1977, 74, 4872-4875
45. Ilavarasi, R.; Rao, M. N. S.; Udupa, M. R. Proc.-Indian Acad. Sci., Chem. Sci. 1997, 109, 79-87
46. Samijlenko, S. P.; Krechkivska, O. M.; Kosach, D. A.; Hovorun, D. M. J. Mol. Struct. 2004, 708, 97-104
47. Añorbe, M. A.; Lüth, M. S.; Roitzsch, M.; Cerdà, M. M.; Lax, P.; Kampf, G.; Sigel, H.; Lippert, B. Chem.-Eur. J. 2004, 10, 1046-1057
48. Mukherjea, K. K.; Bhaduri, I. Transition Met. Chem. 2002, 27, 22-26
49. CRC Handbook of Chemistry and Physics, 84 th ed.; Lide, D. R., Ed.; CRC Press: Boca Raton, FL, 2003.