Photochemical reaction of ozone and 1,1,1,3,3,3-hexamethyldisilazane: Analysis of the gas reaction between precursors in a photochemical vapor deposition process

Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7349-7355

  Nakamura, Ken ^a   Nonaka, Hidehiko ^a   Kameda, Naoto ^a,b   Nishiguchi, Tetsuya ^a,b   Ichimura, Shingo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b MEIDENSHA CORPORATION   (Japan)

Author keywords

CVD; HMDS; Infrared absorption; Mass spectrometry; Organosilane; Oxide; Ozone; Photodissociation; Photoreaction; SiO2

Indexed keywords

ABSORPTION; CHEMICAL VAPOR DEPOSITION; ENERGY ABSORPTION; FOURIER TRANSFORMS; GAS ABSORPTION; GASES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; INFRARED ABSORPTION; INFRARED SPECTROSCOPY; MASS SPECTROMETERS; MASS SPECTROMETRY; OZONE; PHOTOCHEMICAL REACTIONS; PHOTOLYSIS; SEMICONDUCTING SILICON; SILANES; SILICON; SILICON COMPOUNDS; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION; VAPORS; PHOTODISSOCIATION; PHOTOREACTIVITY;

CVD; HMDS; ORGANOSILANE; PHOTOREACTION; SIO2; ORGANOSLLANE;

ABSORPTION SPECTROSCOPY;

EID: 55149110932     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.7349     Document Type: Article

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