Evaluation of oxygen plasma and UV ozone methods for cleaning of occluded areas in MEMS devices

Journal of Microelectromechanical Systems

Volumn 19, Issue 6, 2010, Pages 1292-1298

  Hook, D Adam ^a   Olhausen, James A ^b   Krim, Jacqueline ^a   Dugger, Michael T ^b  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Cleaning procedures; FOTAS; organic monolayer coating; oxygen plasma; surface preparation; TOF SIMS; UV ozone

Indexed keywords

CLEANING PROCEDURES; FOTAS; ORGANIC MONOLAYER COATING; OXYGEN PLASMA; SURFACE PREPARATION; TOF SIMS; UV OZONE;

ASPECT RATIO; CHEMISORPTION; COMPOSITE MICROMECHANICS; ELECTRON ENERGY LEVELS; MEMS; MICROELECTROMECHANICAL DEVICES; MONOLAYERS; ORGANIC COATINGS; OZONE; PLASMAS; SECONDARY ION MASS SPECTROMETRY;

CLEANING;

EID: 78649673539     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2067193     Document Type: Article

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