High-resolution silicon patterning with self-assembled monolayer resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4085-4090

  Lercel, M J ^a,c   Whelan, C S ^a   Craighead, H G ^a   Seshadri, K ^b   Allara, D L ^b  

^a Department of Obstetrics Gynecology   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

^c IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000144413     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588596     Document Type: Article

References (18)

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