SCOPUS 정보 검색 플랫폼

Scripta Materialia

Volumn 74, Issue , 2014, Pages 19-24

Hybrid low dielectric constant thin films for microelectronics

(4) Volksen, W a Lionti, K a Magbitang, T a Dubois, G a

a IBM ALMADEN RESEARCH CENTER (United States)

Author keywords

Low k; Mechanical properties; Plasma damage; Porosity

Indexed keywords

MECHANICAL PROPERTIES; MICROELECTRONICS; POROSITY; POROUS MATERIALS; THIN FILM CIRCUITS;

ELECTRICAL PERFORMANCE; LOW DIELECTRIC CONSTANTS; LOW-K MATERIALS; PLASMA DAMAGE; PLASMA RESISTANCE;

LOW-K DIELECTRIC; POROSITY;

EID: 84891000678 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/j.scriptamat.2013.05.025 Document Type: Article

Times cited : (34)

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