Low-k periodic mesoporous organosilica with air walls: POSS-PMO

Journal of the American Chemical Society

Volumn 133, Issue 45, 2011, Pages 18082-18085

  Seino, Makoto ^a   Wang, Wendong ^b   Lofgreen, Jennifer E ^b   Puzzo, Daniel P ^b   Manabe, Takao ^a   Ozin, Geoffrey A ^b  

^a KANEKA CORPORATION   (Japan)

^b UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AIR POCKETS; EVAPORATION-INDUCED SELF-ASSEMBLY; PERIODIC MESOPOROUS ORGANOSILICAS; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; PORE WALL;

OLIGOMERS;

SILICA;

OLIGOMER; PERIODIC MESOPOROUS ORGANOSILICA; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CONTROLLED STUDY; DIELECTRIC CONSTANT; POROSITY;

AIR; MOLECULAR STRUCTURE; ORGANOSILICON COMPOUNDS; PARTICLE SIZE; POROSITY; SURFACE PROPERTIES;

EID: 80755172359     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja2080136     Document Type: Article

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