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Japanese Journal of Applied Physics

Volumn 50, Issue 5 PART 2, 2011, Pages

Effectiveness of dimethyl carbonate and dipivaloyl methane chemicals for internal repair of plasma-damaged low-k films

(4) Nagano, Shuji a Sakoda, Kaoru a Hasaka, Satoshi a Kobayashi, Kiyoteru b

a TAIYO NIPPON SANSO CORPORATION (Japan)

b TOKAI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; DIMETHYL CARBONATE; LOW-K FILMS; METHOXY GROUP; OXYGEN SITE; PLASMA PROCESS; RELATIVE DIELECTRIC CONSTANT; SIOC-H FILM;

CHEMICAL ANALYSIS; CHEMICALS; INFRARED SPECTROSCOPY; METHANE; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; SILICON OXIDES; WATER ABSORPTION;

RESTORATION;

EID: 79957490903 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.05EB08 Document Type: Article

Times cited : (4)

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