A model-based methodology for the analysis and design of atomic layer deposition processes-Part III: Constrained multi-objective optimization

Chemical Engineering Science

Volumn 96, Issue , 2013, Pages 71-86

  Holmqvist, A ^a   Torndahl T ^b   Stenstrom S ^a  

^a LUND UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

Atomic layer deposition; Mathematical modeling; Numerical analysis; Optimization; Transport processes; Uncertainty and sensitivity analysis

Indexed keywords

ATMOSPHERIC PRESSURE; DEPOSITION; DESIGN; MATHEMATICAL MODELS; MONTE CARLO METHODS; MULTIOBJECTIVE OPTIMIZATION; NORMAL DISTRIBUTION; NUMERICAL ANALYSIS; OPTIMIZATION; SENSITIVITY ANALYSIS; UNCERTAINTY ANALYSIS;

CONSTRAINED MULTI-OBJECTIVE OPTIMIZATIONS; MONTE CARLO SIMULATIONS; MULTI-VARIATE NORMAL DISTRIBUTIONS; OPERATIONAL CONSTRAINTS; PARAMETRIC UNCERTAINTIES; PARETO OPTIMAL SOLUTIONS; TRANSPORT PROCESS; UNCERTAINTY AND SENSITIVITY ANALYSIS;

ATOMIC LAYER DEPOSITION;

EID: 84877049721     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2013.03.061     Document Type: Article

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