Development of a multiscale model for an atomic layer deposition process

Journal of Crystal Growth

Volumn 312, Issue 8, 2010, Pages 1449-1452

  Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

A1. Computer simulation; A1. Growth models; A1. Mass transfer; A1. Surface structure; A3. Atomic layer epitaxy

Indexed keywords

A1. GROWTH MODELS; A1. MASS TRANSFER; A1. SURFACE STRUCTURE; A3. ATOMIC LAYER EPITAXY; GROWTH MODELS;

COMPUTATIONAL METHODS; COMPUTER SIMULATION; CRYSTAL GROWTH; FILM GROWTH; MASS TRANSFER; MONTE CARLO METHODS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; SURFACES;

ATOMS;

EID: 77949578167     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.12.041     Document Type: Article

References (13)

1. 3 growth in an atomic layer deposition process, 2009, submitted for publication.
2. Albo S.E., Broadbelt L.J., and Snurr R.Q. Multiscale modeling of transport and residence times in nanostructured membranes. A.I.Ch.E.J. 52 (2006) 3679-3687
3. P. Banerjee, I. Perez, L. Henn-Lecordier, S.B. Lee, G.W. Rubloff, Nanotubular metal-insulator-metal capacitor arrays for energy storage, Nat. Nanotechnol. (2009).
4. 2 O in a binary reaction sequence. Surf. Sci. 322 (1995) 230-242
5. Elam J.W., Xiong G., Han C.Y., Wang H.H., Birrell J.P., Welp U., Hryn J.N., Pellin M.J., Baumann T.F., Poco J.F., and Satcher Jr. J.H. Atomic layer deposition for the conformal coating of nanoporous materials. J. Nanomat. (2006) 1-5
6. Elliott S.D., and Greer J.C. Simulating the atomic layer deposition of alumina from first principles. J. Mater. Chem. 14 (2004) 3246-3250
7. Granneman E., Fischer P., Pierreux D., Terhorst H., and Zagwijn P. Batch ALD: characteristics, comparison with single wafer ALD, and examples. Surf. Coatings Technol. 201 (2007) 8899-8907
8. 3 films using a binary reaction sequence chemistry. Appl. Surf. Sci. 107 (1996) 128-136
9. Pellin M.J., Stair P.C., Xiong G., Elam J.W., Birrell J., Curtiss L., George S.M., Han C.Y., Iton L., Kung H., Kung M., and Wang H.-H. Mesoporous catalytic membranes: synthetic control of pore size and wall composition. Catal. Lett. 102 (2005) 127-130
10. Perez I., Robertson E., Banerjee P., Henn-Lecordier L., Son S.J., Lee S.B., and Rubloff G.W. Efficient nanotube metrology and application to nanodevices employing atomic layer deposition. Small 4 (2008) 1223-1232
11. Puurunen R.L. Surface chemistry of atomic later deposition: a case study of the trimethylaluminum/water system. Appl. Phys. Rev. 97 (2005) 121301
12. L. Song, S. Shen, K.S. Tsakalis, P.E. Crouch, T.S. Cale, Optimal control for increasing throughput in low pressure chemical vapor deposition, in: Proceedings of 35th CDC, December 1996.
13. Widjaja Y., and Musgrave C.B. Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition. Appl. Phys. Lett. 80 (2002) 3304-3306