Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Yanguas Gil, Angel ^a   Elam, Jeffrey W ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

1-D MODELS; ATOMIC LAYER; CONFORMALITY; EXPERIMENTAL CONDITIONS; INDEPENDENT PARAMETERS; MASS FLOW RATE; SATURATION CURVE; SIMPLIFYING ASSUMPTIONS; THICKNESS PROFILES; THICKNESS UNIFORMITY; TRANSPORT PROBLEMS; TRIMETHYL ALUMINUMS; TUBULAR REACTORS; WALL RECOMBINATION;

ATOMIC LAYER DEPOSITION; DEPOSITION;

ALUMINUM COATINGS;

EID: 84855607708     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3670396     Document Type: Article

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