Use of a high-flow diaphragm valve in the exhaust line of atomic layer deposition reactors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Dasgupta, Neil P ^a   Trejo, Orlando ^a   Prinz, Fritz B ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BASE PRESSURE; DIAPHRAGM VALVES; EXPOSURE TIME; FLOW COEFFICIENTS; PUMPING EFFICIENCY; REACTION CHAMBERS; SI WAFER; STOP VALVES; ZNO FILMS;

ATOMIC LAYER DEPOSITION; PUMPS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; ZINC OXIDE;

DIAPHRAGMS;

EID: 84855588486     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3656945     Document Type: Article

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