Effect of temperature and gas velocity on growth per cycle during Al 2O 3 and ZnO atomic layer deposition at atmospheric pressure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

  Mousa, Moataz Bellah M ^a   Oldham, Christopher J ^a   Jur, Jesse S ^b   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURES; ANALYTICAL EXPRESSIONS; BOUNDARY LAYER THICKNESS; CONTROLLED GROWTH; EFFECT OF TEMPERATURE; FLUID BOUNDARY; GAS VELOCITY; GROWTH PER CYCLE; GROWTH SURFACES; HIGH GROWTH; HIGH PRESSURE; LOW-TEMPERATURE REGIME; OXIDE SURFACE; PHYSISORBED; PROCESS PRESSURE; PROCESS TEMPERATURE; PRODUCT DESORPTION; REACTOR PRESSURES; ZNO;

ALUMINA; ALUMINUM; ATMOSPHERIC PRESSURE; ATOMIC LAYER DEPOSITION; BOUNDARY LAYERS; DESORPTION; GASES; HIGH PRESSURE EFFECTS; VELOCITY; ZINC OXIDE;

ATMOSPHERIC TEMPERATURE;

EID: 84855600443     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3670961     Document Type: Article

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