SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

Continuous atomic layer deposition: Explanation for anomalous growth rate effects

(3) Maydannik, Philipp S a Kaariainen, Tommi O a Cameron, David C a

a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; DIFFERENT PRECURSORS; FLEXIBLE SUBSTRATE; GAS ENTRAINMENT; HELIUM TRANSPORT; PHYSICAL MODEL; PHYSICAL PRINCIPLES; RATE EFFECTS; SUBSTRATE SURFACE; SUBSTRATE TEMPERATURE; TRACER GAS; TRIMETHYLALUMINIUM; VAPOR ZONE; WATER MOLECULE;

ADSORPTION; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; BOUNDARY LAYERS; COMPUTER SIMULATION; HELIUM;

SUBSTRATES;

EID: 84855607443 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3662861 Document Type: Article

Times cited : (26)

References (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.