Atomic layer deposition of Al 2O 3 and ZnO at atmospheric pressure in a flow tube reactor

ACS Applied Materials and Interfaces

Volumn 3, Issue 2, 2011, Pages 299-308

  Jur, Jesse S ^a   Parsons, Gregory N ^b  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

Author keywords

Al 2O 3; Atmospheric pressure; Atomic layer deposition; Roll to roll; Textiles; Thin film growth; ZnO

Indexed keywords

ALD PRECURSOR; AMBIENT PRESSURES; ATOMIC LAYER; FLEXIBLE SUBSTRATE; FLOW CONDITION; FLOW TUBE REACTOR; FLOWTHROUGH; FUNCTION OF PRESSURE; HIGH PRESSURE; HIGH SURFACE AREA; HIGH-THROUGHPUT; IN-SITU; INORGANIC MATERIALS; KEY RELATIONS; LOW PRESSURES; LOW VAPOR PRESSURES; NANOSCALE THIN FILMS; POLYMER SHEET; REACTIVE SPECIES; REACTOR DESIGNS; REACTOR PRESSURES; ROLL TO ROLL; SPECIES DIFFUSION; SUBSTRATE SURFACE; TEXTILE MATERIALS; UNIFORM COATING; ZNO;

ALUMINUM; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC LAYER DEPOSITION; ATOMS; CHARACTERIZATION; ECOLOGY; FILM GROWTH; FLOW OF GASES; FLOW RATE; INERT GASES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SUBSTRATES; TEXTILE PROCESSING; TEXTILES; THICKNESS MEASUREMENT; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

DEPOSITION;

EID: 84855609774     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100940g     Document Type: Article

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