A ballistic transport and surface reaction model for simulating atomic layer deposition processes in high-aspect-ratio nanopores

Chemical Vapor Deposition

Volumn 17, Issue 10-12, 2011, Pages 353-365

  Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

Atomic layer deposition; ballistic transport; Knudsen diffusion; nanopores; simulation

Indexed keywords

ATOMIC LAYER; BALLISTIC TRANSPORT; BALLISTIC TRANSPORTS; CHEMICAL PRECURSORS; CONFORMAL DEPOSITION; EXPOSURE LEVEL; EXPOSURE PERIOD; GAS-PHASE SPECIES; HIGH ASPECT RATIO; HIGH ASPECT RATIO STRUCTURES; KNUDSEN DIFFUSION; KNUDSEN NUMBERS; NANO-MANUFACTURING; NANOPOROUS MATERIALS; PHYSICAL MECHANISM; PHYSICALLY BASED MODELS; PORE GEOMETRY; PORE SURFACE; SIMULATION; SURFACE REACTION MODELS; TRANSMISSION PROBABILITIES; TRANSPORT MODELS;

ASPECT RATIO; ATOMIC LAYER DEPOSITION; ATOMS; BALLISTICS; COMPUTER SIMULATION; MATERIALS PROPERTIES; NANOPORES; POROUS MATERIALS; SURFACE PROPERTIES; SURFACES; TRANSPORT PROPERTIES;

SURFACE REACTIONS;

EID: 83755221158     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201106922     Document Type: Article

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