Gas diffusion ultrabarriers on polymer substrates using Al2 O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 106, Issue 2, 2009, Pages

  Carcia, P F ^a   McLean, R S ^a   Groner, M D ^b   Dameron, A A ^b   George, S M ^b,c  

^a DUPONT COMPANY   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; GAS DIFFUSION; POLYMER SUBSTRATE; RELATIVE HUMIDITIES; WATER VAPOR TRANSMISSION RATE;

ALUMINUM; ATMOSPHERIC HUMIDITY; ATOMIC LAYER DEPOSITION; ATOMS; CALCIUM; CAPILLARITY; DIFFUSION BARRIERS; DIFFUSION IN GASES; GAS PERMEABLE MEMBRANES; PLASMA DEPOSITION; PLASMAS; SILICON NITRIDE; VAPOR DEPOSITION; WATER VAPOR;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 68249136905     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3159639     Document Type: Article

References (31)

1. S. Wagner, H. Gleskova, I. C. Cheng, and M. Wu, Thin Solid Films 0040-6090 430, 15 (2003).
2. J. S. Lewis and M. S. Weaver, IEEE J. Quantum Electron. 0018-9197 10, 45 (2004). 10.1109/JSTQE.2004.824072
3. S. M. George, A. W. Ott, and J. W. Klaus, J. Phys. Chem. 0022-3654 100, 13121 (1996). 10.1021/jp9536763
4. M. Ritala and M. Leskela, in Handbook of Thin Film Materials, edited by, H. S. Nalwa, (Academic, New York, 2001).
5. M. Ritala, M. Leskela, J. P. Dekker, C. Mutsaers, P. J. Soininen, and J. Skarp, Chem. Vap. Deposition 0948-1907 5, 7 (1999). 10.1002/(SICI)1521- 3862(199901)5:1<7::AID-CVDE7>3.0.CO;2-J
6. M. D. Groner, J. W. Elam, F. H. Fabreguette, and S. M. George, Thin Solid Films 0040-6090 413, 186 (2002). 10.1016/S0040-6090(02)00438-8 (Pubitemid 34772312)
7. P. F. Carcia, R. S. McLean, M. H. Reilly, M. D. Groner, and S. M. George, Appl. Phys. Lett. 0003-6951 89, 031915 (2006). 10.1063/1.2221912 (Pubitemid 44107043)
8. A. A. Dameron, S. D. Davidson, B. B. Burton, P. F. Carcia, R. S. McLean, and S. M. George, J. Phys. Chem. C 1932-7447 112, 4573 (2008). 10.1021/jp076866+
9. S. Ferrari, F. Perissinotti, E. Peron, L. Fumagalli, D. Natali, and M. Sampietro, Org. Electron. 1566-1199 8, 407 (2007). 10.1016/j.orgel.2007.02.004 (Pubitemid 46755048)
10. A. P. Ghosh, L. J. Gerenser, C. M. Jarman, and J. E. Fornalik, Appl. Phys. Lett. 0003-6951 86, 223503 (2005). 10.1063/1.1929867 (Pubitemid 40861631)
11. M. D. Groner, S. M. George, R. S. McLean, and P. F. Carcia, Appl. Phys. Lett. 0003-6951 88, 051907 (2006). 10.1063/1.2168489 (Pubitemid 43190860)
12. E. Langereis, M. Creatore, S. B. S. Heil, M. C. M. Van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 0003-6951 89, 081915 (2006). 10.1063/1.2338776 (Pubitemid 44286139)
13. S. H. K. Park, J. Oh, C. S. Hwang, J. I. Lee, Y. S. Yang, and H. Y. Chu, Electrochem. Solid-State Lett. 1099-0062 8, H21 (2005). 10.1149/1.1850396 (Pubitemid 40214051)
14. W. J. Potscavage, S. Yoo, B. Domercq, and B. Kippelen, Appl. Phys. Lett. 0003-6951 90, 253511 (2007). 10.1063/1.2751108 (Pubitemid 47141253)
15. S. J. Yun, Y. W. Ko, and J. W. Lim, Appl. Phys. Lett. 0003-6951 85, 4896 (2004). 10.1063/1.1826238
16. A. S. da Silva Sobrinho, M. Latreche, G. Czeremuszkin, J. E. Klemberg-Sapieha, and M. R. Wertheimer, J. Vac. Sci. Technol. A 0734-2101 16, 3190 (1998). 10.1116/1.581519 (Pubitemid 128161018)
17. H. Chatham, Surf. Coat. Technol. 0257-8972 78, 1 (1996). 10.1016/0257-8972(95)02420-4
18. A. C. Dillon, A. W. Ott, J. D. Way, and S. M. George, Surf. Sci. 0039-6028 322, 230 (1995). 10.1016/0039-6028(95)90033-0
19. A. W. Ott, J. W. Klaus, J. M. Johnson, and S. M. George, Thin Solid Films 0040-6090 292, 135 (1997). 10.1016/S0040-6090(96)08934-1
20. G. Nisato, P. C. P. Bouten, P. J. Slikkerveer, W. D. Bennett, G. L. Graff, N. Rutherford, L. Wiese, International Display Research Conference, Asia Display/IDW 01, 2001 (unpublished), p. 1435.
21. M. D. Groner, F. H. Fabreguette, J. W. Elam, and S. M. George, Chem. Mater. 0897-4756 16, 639 (2004). 10.1021/cm0304546
22. J. W. Elam, M. D. Groner, and S. M. George, Rev. Sci. Instrum. 0034-6748 73, 2981 (2002). 10.1063/1.1490410 (Pubitemid 34946326)
23. C. M. Ramsdale and N. C. Greenham, J. Phys. D 0022-3727 36, L29 (2003). 10.1088/0022-3727/36/4/101
24. R. Paetzold, A. Winnacker, D. Henseler, V. Cesari, and K. Heuser, Rev. Sci. Instrum. 0034-6748 74, 5147 (2003). 10.1063/1.1626015
25. M. Ohring, The Materials Science of Thin Films (Academic, New York, 1991), p. 227.
26. 2 day.
27. A. S. da Silva Sobrinho, G. Czeremuszkin, M. Latreche, and M. R. Wertheimer, J. Vac. Sci. Technol. A 0734-2101 18, 149 (2000). 10.1116/1.582156 (Pubitemid 30896791)
28. M. Hanika, H. C. Langowski, U. Moosheimer, and W. Peukert, Chem. Eng. Technol. 0930-7516 26, 605 (2003). 10.1002/ceat.200390093 (Pubitemid 36705033)
29. G. Rossi and M. Nulman, J. Appl. Phys. 0021-8979 74, 5471 (1993). 10.1063/1.354227
30. G. L. Graff, R. E. Williford, and P. E. Burrows, J. Appl. Phys. 0021-8979 96, 1840 (2004). 10.1063/1.1768610
31. P. de Rouffignac, Z. W. Li, and R. G. Gordon, Electrochem. Solid-State Lett. 1099-0062 7, G306 (2004). 10.1149/1.1814594 (Pubitemid 40015897)