Photovoltaic properties of a-Si:H films grown by plasma enhanced chemical vapor deposition: A review

Materials Express

Volumn 2, Issue 3, 2012, Pages 177-196

  Ramanujam, Jeyakumar ^a,c   Verma, Amit ^b  

^a MCMASTER UNIVERSITY   (Canada)

^b Texas AandM University Kingsville   (United States)

^c NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

BIPV; Buffer layer; Factors affecting efficiency; Hydrogenated amorphous silicon films; Large area deposition; Photodegradation; Plasma enhanced chemical vapor deposition; Properties of amorphous silicon films; Thin film photovoltaics; Variable high frequency

Indexed keywords

EID: 84871603888     PISSN: 21585849     EISSN: 21585857     Source Type: Journal    
DOI: 10.1166/mex.2012.1073     Document Type: Review

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